公开(公告)号：US20070040999A1

公开(公告)日：2007-02-22

申请号：US11207996

申请日：2005-08-22

申请人： Maarten Marinus Wilhelmus Van Herpen ,  Carolus Ida Spee ,  Derk Klunder ,  Antonius De Mol

发明人： Maarten Marinus Wilhelmus Van Herpen ,  Carolus Ida Spee ,  Derk Klunder ,  Antonius De Mol

IPC分类号： B08B6/00

CPC分类号： G03F7/70925

摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas and one or more additional compounds selected from the group of hydrocarbon compounds and silane compounds in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

摘要翻译： 在包括光学元件的设备的光学元件上去除沉积物的方法包括提供含H2S气体和一种或多种选自烃化合物和硅烷化合物的其它化合物 该装置的至少一部分包括从含H 2 N 2气体从H 2 H生成氢自由基; 并使具有沉积的光学元件与至少部分氢自由基接触并除去至少部分沉积物。 此外，用于保护包括光学元件的装置的光学元件的方法包括通过沉积工艺向光学元件提供盖层; 并且在使用所述装置期间或之后，如上所述在去除过程中从所述光学元件中去除所述盖层的至少一部分。 该方法可以应用在光刻设备中。