公开(公告)号：US20080201003A1

公开(公告)日：2008-08-21

申请号：US11708391

申请日：2007-02-20

申请人： Ashish Maskara ,  Nurulhuda Binte Jumahri

发明人： Ashish Maskara ,  Nurulhuda Binte Jumahri

IPC分类号： G06F19/00

CPC分类号： G05B19/41865 ,  G05B2219/32266 ,  G05B2219/32267 ,  G05B2219/45031

摘要： Methods and systems for reticle scheduling in semiconductor manufacturing providing a trade-off between complying with level priority and maximizing scanner utilization for critical scanners as a whole is disclosed. The extent of trade-off is specified by user, depending on scanner excess capacity. The method invented comprises, first, the steps of an initialization block performing splitting planning horizon into time buckets, initialization of system variables, and reading data on work-in-process, scanner/reticle status and reticle locations. The following block determines which buckets to run optimization for. The next method block is building a network for optimization based on inputs from inline real-time dispatching (RTD) followed by running optimization of the network. The last method block updates WIP and reticle information based on optimization results and feeds the results into a wafer lot assignment system.

摘要翻译： 公开了用于半导体制造中的掩模版调度的方法和系统，其提供了在满足关键扫描仪整体上的优先级和最大化扫描仪利用率之间的权衡。 权衡的范围由用户指定，具体取决于扫描仪的过剩容量。 所发明的方法包括：首先，将初始化块执行到时间段中的分割计划水平面，系统变量的初始化以及在处理中的读取数据，扫描仪/掩模版状态和掩模版位置的步骤。 以下块确定要为哪个存储区运行优化。 下一个方法块是基于来自在线实时调度（RTD）的输入来构建网络进行优化，然后运行网络优化。 最后的方法块基于优化结果更新WIP和标线信息，并将结果馈送到晶片批次分配系统。