公开(公告)号：US20120256333A1

公开(公告)日：2012-10-11

申请号：US13527996

申请日：2012-06-20

Applicant: Ayse Hancer-Ademuwagun ,  Songtao Wu ,  Debasish Banerjee ,  Minjuan Zhang ,  Masahiko Ishii

Inventor： Ayse Hancer-Ademuwagun ,  Songtao Wu ,  Debasish Banerjee ,  Minjuan Zhang ,  Masahiko Ishii

IPC: B29C41/00 ,  B29D11/00

CPC classification number: C23C16/01

Abstract: A process for manufacturing stand-alone multilayer thin films is provided. The process includes providing a substrate, depositing a sacrificial layer onto the substrate and the depositing multilayer thin film onto the sacrificial layer. Thereafter, the substrate, sacrificial layer and thin film structure are exposed to chemical solutions. The chemical solution selectively reacts with the sacrificial layer to remove the sacrificial layer, thereby affording for an intact multilayer stand-alone thin film to separate from the substrate. The color and optical properties of the multilayer thin film are not affected by the removal of the sacrificial layer.

Abstract translation: 提供了制造独立多层薄膜的方法。 该方法包括提供衬底，将牺牲层沉积到衬底上并将多层薄膜沉积到牺牲层上。 此后，将基板，牺牲层和薄膜结构暴露于化学溶液。 化学溶液选择性地与牺牲层反应以除去牺牲层，从而提供完整的多层独立薄膜与基底分离。 多层薄膜的颜色和光学特性不受去除牺牲层的影响。