公开(公告)号：US20060016649A1

公开(公告)日：2006-01-26

申请号：US11098956

申请日：2005-04-04

申请人： Faramarz Gordaninejad ,  Xiaojie Wang ,  Gregory Hitchcock ,  Barkan Kavlicoglu ,  Krishna Bangrakulur

发明人： Faramarz Gordaninejad ,  Xiaojie Wang ,  Gregory Hitchcock ,  Barkan Kavlicoglu ,  Krishna Bangrakulur

IPC分类号： F16F15/03

CPC分类号： F16F9/537

摘要： Variably controllable motion-damping devices are disclosed that utilize a magneto-rheological fluid (MRF). One configuration of such a device includes a first valving region and a second valving region connected to the first valving region. Between the first and second valving regions is a plate having a first surface adjacent the first valving region and a second surface adjacent the second valving region. At least one of the first and second surfaces is treated to impart a significantly increased shear yield stress to columnized MRF particles passing over the surface, compared to an otherwise similar untreated surface. An MRF is contained in the first and second valving regions such that the MRF can flow through the first and second valving regions. Motion of a first object relative to a second object is damped by causing flow of MRF through the first and second valving regions. A magnet produces a magnetic field within at least one of the valving regions. MRF flow is constrained by the magnetic field and the treated surface sufficiently to damp the relative motion.

摘要翻译： 公开了使用磁流变流体（MRF）的可变控制运动阻尼装置。 这种装置的一种结构包括第一阀区和连接到第一阀区的第二阀区。 在第一和第二阀区之间是具有邻近第一阀区的第一表面和邻近第二阀区的第二表面的板。 处理第一表面和第二表面中的至少一个以对于通过表面的柱状MRF颗粒给予显着提高的剪切屈服应力，与其它类似的未处理表面相比。 MRF包含在第一和第二阀区域中，使得MRF可以流过第一和第二阀区域。 使第一物体相对于第二物体的运动通过使MRF流过第一和第二阀区而被阻尼。 磁体在至少一个阀区域内产生磁场。 MRF流动受到磁场和被处理表面的约束，足以阻止相对运动。