公开(公告)号：US20220272969A1

公开(公告)日：2022-09-01

申请号：US17652373

申请日：2022-02-24

申请人： Berkshire Corporation

发明人： TODD SHOWALTER ,  SUSAN FAILE ,  NATHAN HEATON ,  WENYU ZHANG

IPC分类号： A01N25/34 ,  A01N25/10 ,  A01N43/90 ,  A01P1/00

摘要： A portion of personal protective equipment treated with a topically applied finish containing a reactive oxygen species-generating dye (ROS) activated by electromagnetic radiation in the visible light region coated on the substrate with the ROS dye incorporated between 0.01-5.00% on weight of substrate to provide antimicrobial or self-cleaning benefits to the textile substrate.

公开(公告)号：US20030200994A1

公开(公告)日：2003-10-30

申请号：US10407550

申请日：2003-04-04

申请人： BERKSHIRE CORPORATION

发明人： Harald A. Bailey

IPC分类号： B08B011/00

CPC分类号： B08B1/04 ,  B08B3/04

摘要： A cleaning/polishing pad has a first surface with raised, substantially nubs, having a length greater than a width, arranged adjacent each other forming laterally alternating rows of nubs and having troughs interspersed therebetween, a second surface opposite the first surface, and a thickness. The troughs, which may contain polishing/cleaning chemicals, are divided into first and second groups of substantially parallel troughs. The groups of troughs are arranged at an angle to one another forming a hatch pattern. The pad can be formed to make roller brushes, circular brushes or manual wipes. For the circular brushes the nubs are arranged adjacent each other forming laterally alternating concentric circles of nubs. Micropores are interspersed within the pad having a gradient of pores with smaller pores towards the first surface and larger pores towards the second. There are no sharp edges or corners in/on the pad.

公开(公告)号：US20240228910A1

公开(公告)日：2024-07-11

申请号：US18404109

申请日：2024-01-04

申请人： Berkshire Corporation

发明人： Todd Showalter ,  Wenyu Zhang

IPC分类号： C11D3/20 ,  C11D1/37 ,  C11D3/40 ,  C11D3/48 ,  C11D3/50 ,  C11D17/00 ,  C11D17/04

CPC分类号： C11D3/2079 ,  C11D1/37 ,  C11D3/40 ,  C11D3/48 ,  C11D3/50 ,  C11D17/0008 ,  C11D17/041

摘要： Methods and antimicrobial compositions are provided for surface cleaning. The antimicrobial compositions which include very low concentrations of an organic acid and one or more anionic surfactants can, unexpectedly, provide effective and broad spectrum antimicrobial activity within two minutes of contact with a surface and in some instances within one minute of contact time. Contacting the antimicrobial compositions with a surface can result in greater than or equal to about 4.0 log kill or 5.0 log kill for one or more of Staphylococcus aureus, Pseudomonas aeruginosa, and Salmonella enterica on the surface in two minutes or less. The compositions can have antimicrobial activity against at least one gram-positive bacterium, gram-negative bacterium, virus, and fungus in two minutes or less of contacting the composition with a surface.