Apparatus for the continuous coating of band-type substrate
    1.
    发明授权
    Apparatus for the continuous coating of band-type substrate 失效
    用于连续涂布带状基材的装置

    公开(公告)号:US5242500A

    公开(公告)日:1993-09-07

    申请号:US885079

    申请日:1992-05-18

    IPC分类号: C23C14/56

    CPC分类号: C23C14/562

    摘要: An apparatus for the continuous coating of band-type substrates in a vacuum chamber comprises a plurality of evaporation vessels 1, 1', . . . of the same size and configuration. These vessels form a row of evaporation vessels aligned with the direction of movement of the band and are spaced approximately equally apart. All vessels are made of an electrically conductive, ceramic material and can be heated by directly passing a current. Provision is made for a device for the continuous supply of wire to be evaporated to the evaporator vessels. The individual evaporator vessels 1, 1', . . . of the row are offset with respect to one another. Together, they cover a small coating zone B which extends transversely to the direction of movement A of the band.

    摘要翻译: 用于在真空室中连续涂覆带状基底的装置包括多个蒸发容器1,1'。 。 。 具有相同的尺寸和配置。 这些容器形成一排与带的移动方向对准的蒸发容器,并且间隔开大致相等。 所有容器均由导电陶瓷材料制成,可直接通过电流加热。 规定了用于连续供应待蒸发到蒸发器容器的电线的装置。 单个蒸发器容器1,1',。 。 。 的行相对于彼此偏移。 它们一起覆盖横向于带的运动方向A的小涂层区B。