公开(公告)号：US06999042B2

公开(公告)日：2006-02-14

申请号：US10377832

申请日：2003-03-03

Applicant: Russell W. Dearnley ,  Bob Elliot

Inventor： Russell W. Dearnley ,  Bob Elliot

IPC: H01Q1/12

CPC classification number: H01Q1/1242 ,  H01Q1/1207 ,  H01Q1/246 ,  H01Q1/44 ,  H01Q3/26

Abstract: An antenna system incorporating at least two antennas circumferentially arranged with a side-by-side relationship about a monopole tower. The main beam direction of the radiation pattern emanating from each antenna may be remotely adjusted in elevation and/or azimuth. The main beam direction of the radiation pattern emanating from adjacent antennas may be varied independently. The antennas may be partitioned in one or more vertically-spaced groups each of which is arranged about a circumference of the monopole tower.

Abstract translation: 一个天线系统，其包括至少两个天线，其周向地布置有关于单极塔的并排关系。 从每个天线发出的辐射图的主波束方向可以在仰角和/或方位角进行远程调节。 从相邻天线发出的辐射图案的主波束方向可以独立变化。 天线可以分成一个或多个垂直间隔的组，每个组围绕单极塔的圆周布置。

公开(公告)号：US20060110683A1

公开(公告)日：2006-05-25

申请号：US11220985

申请日：2005-09-08

Applicant: David Brown ,  Peter Erbach ,  Bob Elliot

Inventor： David Brown ,  Peter Erbach ,  Bob Elliot

IPC: G03C5/00

CPC classification number: G03F7/70333

Abstract: Methods for minimizing the errors associated with substrate etching are presented. The methods use intentional defocusing of the pattern image on the photoresist to minimize errors in the etching process particularly grayscale etching and/or multiple exposure contributions from neighboring patterns.

Abstract translation: 提出了最小化与衬底蚀刻相关的误差的方法。 该方法使用光致抗蚀剂上的图案图像有意散焦以最小化蚀刻工艺中的误差，特别是灰度蚀刻和/或来自相邻图案的多次曝光贡献。