公开(公告)号：US07569336B2

公开(公告)日：2009-08-04

申请号：US11533930

申请日：2006-09-21

Applicant: Jun-Ing Kil ,  Sok-Ho Yi ,  Kyong-Hee Kim ,  Hee Seo ,  Bon-Wang Koo ,  Min-Young Kim

Inventor： Jun-Ing Kil ,  Sok-Ho Yi ,  Kyong-Hee Kim ,  Hee Seo ,  Bon-Wang Koo ,  Min-Young Kim

IPC: G03F7/00 ,  G03F7/42

CPC classification number: G03F7/425

Abstract: In a method of forming a pattern using a composition for removing photoresist, a layer is formed on a substrate, and then a photoresist pattern is formed on the layer. A portion of the layer exposed by the photoresist pattern is etched using the photoresist pattern as an etching mask to form the pattern on the substrate. Then, the photoresist pattern is removed using the composition including hydroxylamine, an alkanolamine-based compound, a morpholine-based compound, a polar solvent, a corrosion preventing agent, and water. The composition may effectively remove a photoresist pattern and etched residues without damaging the substrate and/or the pattern including metal, nitride, oxide and/or metal nitride.

Abstract translation: 在使用除去光致抗蚀剂的组合物形成图案的方法中，在基板上形成层，然后在该层上形成光致抗蚀剂图案。 使用光致抗蚀剂图案作为蚀刻掩模蚀刻由光致抗蚀剂图案曝光的层的一部分，以在基板上形成图案。 然后，使用包含羟胺，链烷醇胺类化合物，吗啉类化合物，极性溶剂，防腐剂和水的组合物除去光刻胶图案。 组合物可以有效地去除光致抗蚀剂图案和蚀刻残留物而不损坏衬底和/或包括金属，氮化物，氧化物和/或金属氮化物的图案。

公开(公告)号：US20070128539A1

公开(公告)日：2007-06-07

申请号：US11533930

申请日：2006-09-21

Applicant: Jun-Ing KIL ,  Sok-Ho Yi ,  Kyong-Hee Kim ,  Hee Seo ,  Bon-Wang Koo ,  Min-Young Kim

Inventor： Jun-Ing KIL ,  Sok-Ho Yi ,  Kyong-Hee Kim ,  Hee Seo ,  Bon-Wang Koo ,  Min-Young Kim

IPC: G03C1/00 ,  G03F7/00

CPC classification number: G03F7/425

Abstract: In a method of forming a pattern using a composition for removing photoresist, a layer is formed on a substrate, and then a photoresist pattern is formed on the layer. A portion of the layer exposed by the photoresist pattern is etched using the photoresist pattern as an etching mask to form the pattern on the substrate. Then, the photoresist pattern is removed using the composition including hydroxylamine, an alkanolamine-based compound, a morpholine-based compound, a polar solvent, a corrosion preventing agent, and water. The composition may effectively remove a photoresist pattern and etched residues without damaging the substrate and/or the pattern including metal, nitride, oxide and/or metal nitride.

Abstract translation: 在使用除去光致抗蚀剂的组合物形成图案的方法中，在基板上形成层，然后在该层上形成光致抗蚀剂图案。 使用光致抗蚀剂图案作为蚀刻掩模蚀刻由光致抗蚀剂图案曝光的层的一部分，以在基板上形成图案。 然后，使用包含羟胺，链烷醇胺类化合物，吗啉类化合物，极性溶剂，防腐剂和水的组合物除去光刻胶图案。 组合物可以有效地去除光致抗蚀剂图案和蚀刻残留物而不损坏衬底和/或包括金属，氮化物，氧化物和/或金属氮化物的图案。