Reducing side lobes within optical irradiance distributions used to selectively expose photosensitive surface
    1.
    发明授权
    Reducing side lobes within optical irradiance distributions used to selectively expose photosensitive surface 有权
    用于选择性曝光光敏表面的光学辐射分布中的旁瓣减少

    公开(公告)号:US08085289B1

    公开(公告)日:2011-12-27

    申请号:US12258092

    申请日:2008-10-24

    CPC classification number: B41J2/471 B41J2/473 G02B26/124 G02B27/58

    Abstract: An optical beam is selectively output towards a scanner in accordance with image data for a scan line of an image. The optical beam has a beam irradiance distribution that is elliptical in shape. The optical beam passes through an aperture stop, ordinarily creating side lobes within a focus irradiance distribution of the optical beam. The scanner scans the optical beam to form the scan line on a photosensitive surface by selectively exposing positions along the scan line in accordance with image data. The optical beam is modified before it reaches the photosensitive surface to substantially remove the side lobes that have been created within the focus irradiance distribution and/or to substantially prevent the side lobes from being created within the focus irradiance distribution of the optical beam.

    Abstract translation: 根据图像的扫描线的图像数据,选择性地向扫描仪输出光束。 光束具有椭圆形的光束辐照度分布。 光束通过孔径光阑,通常在光束的聚焦辐照度分布内产生旁瓣。 通过根据图像数据选择性地暴露沿着扫描线的位置,扫描仪扫描光束以在感光表面上形成扫描线。 光束在其到达感光表面之前被修改以基本上去除已经在聚焦辐照度分布内产生的旁瓣,和/或基本上防止在光束的聚焦辐照度分布内产生旁瓣。

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