High electron mobility transistors with Sb-based channels
    1.
    发明授权
    High electron mobility transistors with Sb-based channels 有权
    具有Sb基通道的高电子迁移率晶体管

    公开(公告)号:US07388235B2

    公开(公告)日:2008-06-17

    申请号:US11239431

    申请日:2005-09-20

    IPC分类号: H01L29/739 H01L31/00

    CPC分类号: H01L29/7783

    摘要: This invention pertains to an electronic device containing a semi-insulating substrate, a buffer layer of an antimony-based material disposed on said substrate, a channel layer of InAsySb1-y material disposed on said buffer layer, a barrier layer of an antimony-based disposed on said channel layer, and a cap layer of InAsySb1-y material disposed on said barrier layer, wherein the device can have frequency of on the order of 500 GHz and a reduced power dissipation.

    摘要翻译: 本发明涉及一种电子器件,其包含半绝缘衬底,设置在所述衬底上的锑基材料的缓冲层,InAs Sb 3 Sb 1-y的沟道层, 设置在所述缓冲层上的SUB>材料,设置在所述沟道层上的锑基阻挡层,以及设置在所述缓冲层上的InAsSb 1-y材料的覆盖层 在所述阻挡层上,其中所述器件可以具有大约500GHz的频率和降低的功率耗散。