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1.发明授权
公开(公告)号：US5691542A
公开(公告)日：1997-11-25
申请号：US680306
申请日：1996-07-11
CPC分类号： G01J5/522 , G01J5/0003
摘要： An electro-optical target comprising an emissivity target and a controlled background source that has a temperature greater than, less than or equal to the temperature of the emissivity target. Appropriate adjustment of the temperatures of the emissivity target and heated controlled background source causes the "apparent" temperature of the emissivity target to be less than the specular ambient or background temperature, effectively emitting a negative temperature (delta T) relative to the background temperature produced by the controlled background source. It is useful to have an electro-optical target that emits a negative temperature (delta T) for minimum resolvable temperature testing of FLIR systems, for example, without cooling any of the components of the electro-optical target.
摘要翻译： 包括辐射率靶和受控背景源的电光目标，其具有大于，等于或等于发射率靶的温度的温度。 辐射率目标和加热受控背景源的温度的适当调整导致发射率目标的“明显”温度小于镜面环境或背景温度，有效地发射相对于产生的背景温度的负温度（ΔT） 由受控的背景来源。 具有发射负温度（ΔT）以用于FLIR系统的最小可分解温度测试的电光目标是有用的，例如，不冷却电光目标的任何部件。
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公开(公告)号：US5756991A
公开(公告)日：1998-05-26
申请号：US696760
申请日：1996-08-14
CPC分类号： F41J2/02
摘要： An electro-optical target and test apparatus having an improved resistive heating element. The resistive heating element comprises a resistive thin film coating layer, such as an indium tin oxide resistive coating layer, a resistive thin film semiconductor coating layer, or an electrically resistive polymer layer, that is disposed on a back side of a substrate. The substrate has a target pattern disposed on its front surface that to provide an emissivity target. The resistive coating layer provides a means for heating the substrate which produces a uniform source of thermal radiation because it has no holes therein. The resistive heating element is heated to radiate at a controlled target temperature set by a temperature controller coupled thereto. The materials comprising the coating layer and substrate may be transparent to visible and near infrared radiation. This allows radiation from visible and near infrared components of the system under test to pass through the substrate and resistive heating element to detector(s) located behind the heating element without requiring holes in the emissivity target. Also, use of a transparent substrate and heating element allows the use of visible and/or infrared light sources disposed behind the heating element, and thus the electro-optical target can simultaneously radiate both visible and infrared radiation at the system under test.
摘要翻译： 一种具有改进的电阻加热元件的电光目标和测试装置。 电阻加热元件包括设置在基板的背面上的诸如氧化铟锡电阻涂层的电阻薄膜涂层，电阻薄膜半导体涂层或电阻聚合物层。 基板具有设置在其前表面上以提供发射率目标的目标图案。 电阻涂层提供了一种用于加热衬底的装置，其产生均匀的热辐射源，因为其中没有孔。 电阻加热元件被加热以在由其耦合的温度控制器设置的受控目标温度下辐射。 包括涂层和基底的材料对于可见光和近红外辐射可能是透明的。 这允许被测系统的可见光和近红外分量的辐射通过衬底和电阻加热元件到位于加热元件后面的检测器，而不需要发射率靶中的孔。 此外，使用透明基板和加热元件允许使用设置在加热元件后面的可见光和/或红外光源，因此电光目标可同时在被测系统中辐射可见光和红外辐射。
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