公开(公告)号：US20070289740A1

公开(公告)日：2007-12-20

申请号：US11756554

申请日：2007-05-31

Applicant: Brian Thigpen ,  C. Means ,  Guy Vachon ,  Garabed Yeriazarian ,  Jaedong Lee ,  Chee Chok ,  Clark Sann ,  Xin Liu

Inventor： Brian Thigpen ,  C. Means ,  Guy Vachon ,  Garabed Yeriazarian ,  Jaedong Lee ,  Chee Chok ,  Clark Sann ,  Xin Liu

IPC: E21B43/00 ,  E21B47/00 ,  G06G7/48

CPC classification number: E21B37/06 ,  E21B43/00 ,  E21B43/12 ,  E21B43/14

Abstract: A system and method for supplying an additive into a well is disclosed that includes estimating injection rates for the additives and setting of one or more fluid flow control devices in the well based on a computer model. It is emphasized that this abstract is provided to comply with the rules requiring an abstract which will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 公开了一种将添加剂供应到井中的系统和方法，其包括基于计算机模型估计添加剂的喷射速率和井中的一个或多个流体流量控制装置的设定。 要强调的是，该摘要被提供以符合要求抽象的规则，这将允许搜索者或其他读者快速确定技术公开的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。