METHOD AND SYSTEM FOR AUTO-DISPATCHING LOTS IN PHOTOLITHOGRAPHY PROCESS
    1.
    发明申请
    METHOD AND SYSTEM FOR AUTO-DISPATCHING LOTS IN PHOTOLITHOGRAPHY PROCESS 审中-公开
    用于自动分光光刻技术的方法和系统

    公开(公告)号:US20090062954A1

    公开(公告)日:2009-03-05

    申请号:US12115555

    申请日:2008-05-06

    Abstract: A method and a system for auto-dispatching lots in a photolithography process are provided. According to the method, first, a prioritized lot list is established according to the working status of a plurality of photolithography equipments. Then, a processable lot with the highest priority from the lot list is selected and a relative process background information is used for determining a photolithography operation type. Finally, the selected lot is dispatched according to the photolithography operation type. The present invention dispatches the lot with the appropriate dispatching rule according to the process background information of the lot. As a result, the quality of the photolithography process can be ensured so as to increase the throughput, and the labor overhead can be reduced to achieve the purpose of production cost reduction.

    Abstract translation: 提供了一种用于在光刻工艺中自动调度批次的方法和系统。 根据该方法,首先,根据多个光刻设备的工作状态建立优先的批次列表。 然后,选择具有来自批次列表的最高优先级的可处理批次,并且使用相对过程背景信息来确定光刻操作类型。 最后,根据光刻操作类型调度所选批次。 本发明根据批次的处理背景信息,用适当的调度规则调度批次。 结果,可以确保光刻工艺的质量,从而提高生产量,并且可以减少劳动开销以实现生产成本降低的目的。

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