COMPUTATIONAL HIGHLIGHT HOLOGRAPHY
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    发明申请
    COMPUTATIONAL HIGHLIGHT HOLOGRAPHY 有权
    计算亮点全息图

    公开(公告)号:US20120019882A1

    公开(公告)日:2012-01-26

    申请号:US13167601

    申请日:2011-06-23

    IPC分类号: G03H1/08

    摘要: A technique for fabricating a highlight hologram based on a digital object performs point sampling on the object and represents each sampled point as a geometric patch. A set of geometric patches corresponding to sampled points from the object are fabricated into a substrate. A paraboloid patch may be used for reflective substrates while a hyperboloid may be used for transmissive substrates. To avoid specifying overlapping patches, which are impractical to fabricate, certain of the sample points may be merged. An output set of grooves is saved and may be used to specify fabrication of a highlight hologram on the physical substrate.

    摘要翻译: 基于数字对象制造高光全息图的技术对物体进行点取样,并将每个采样点表示为几何补片。 将对应于来自物体的采样点的一组几何斑块制成基底。 抛物面贴片可以用于反射基板,而双曲面可以用于透射基底。 为了避免指定重叠的补丁,这些补丁是不切合实际的,可能会合并某些采样点。 输出的一组凹槽被保存并且可以用于指定物理基板上的高光全息图的制造。