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公开(公告)号：US08753519B2
公开(公告)日：2014-06-17
申请号：US12735233
申请日：2008-12-23
摘要： A process for removing silicon compounds from aqueous NaCl brine includes, first, adjusting a weak brine to a pH value of less than 3 with hydrochloric acid. Iron(III) chloride or other trivalent iron ions are added to the acidified weak brine, the obtained weak brine is then continuously fed to a stirred dissolution vessel which contains undissolved salt in addition to brine. Fresh salt is charged batch-wise and intermittently to the dissolution vessel to produce strong brine. The obtained strong brine is fed to a stirred buffer vessel, the pH value in this buffer vessel being maintained at a level ranging from 5 to 8. A strong-brine flow is continuously withdrawn from the buffer vessel and filtered, and the filtrate containing the added iron and silicon is discharged. Also a system for carrying out this process is disclosed.
摘要翻译： 从NaCl水溶液中除去硅化合物的方法首先用盐酸调节弱盐水至pH值小于3。 向酸化的弱盐水中加入氯化铁（III）或其他三价铁离子，然后将得到的弱盐水连续加入到除盐水之外含有未溶解的盐的搅拌溶解容器中。 将新鲜盐分批并间歇地加入到溶解容器中以产生强盐水。 将获得的强盐水加入到搅拌的缓冲容器中，该缓冲容器中的pH值保持在5至8的水平。强盐水流从缓冲容器中连续取出并过滤， 添加铁和硅排出。 另外还公开了一种用于执行该过程的系统。
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公开(公告)号：US20110089117A1
公开(公告)日：2011-04-21
申请号：US12735233
申请日：2008-12-23
IPC分类号： B01D21/00
摘要： A process for removing silicon compounds from aqueous NaCl brine includes, first, adjusting a weak brine to a pH value of less than 3 with hydrochloric acid. Iron(III) chloride or other trivalent iron ions are added to the acidified weak brine, the obtained weak brine is then continuously fed to a stirred dissolution vessel which contains undissolved salt in addition to brine. Fresh salt is charged batchwise and intermittently to the dissolution vessel to produce strong brine. The obtained strong brine is fed to a stirred buffer vessel, the pH value in this buffer vessel being maintained at a level ranging from 5 to 8. A strong-brine flow is continuously withdrawn from the buffer vessel and filtered, and the filtrate containing the added iron and silicon is discharged. Also a system for carrying out this process includes: a dissolution vessel for salt, a stirrer in the dissolution vessel, a feed device for batchwise feeding salt to the dissolution vessel, a point for feeding weak brine to the dissolution vessel, points for feeding hydrochloric acid and iron(III) chloride to the weak brine supply line, a buffer vessel for strong brine, a stirrer in the buffer vessel, a flow connection between the dissolution vessel and the buffer vessel, a filter having an outlet for strong brine and a withdrawing device for filter cake, a discharge port and a device for conveying strong brine from the buffer vessel to the filter.
摘要翻译： 从NaCl水溶液中除去硅化合物的方法首先用盐酸调节弱盐水至pH值小于3。 向酸化的弱盐水中加入氯化铁（III）或其他三价铁离子，然后将得到的弱盐水连续加入到除盐水之外含有未溶解的盐的搅拌溶解容器中。 将新鲜盐分批并间歇地加入到溶解容器中以产生强盐水。 将获得的强盐水加入到搅拌的缓冲容器中，该缓冲容器中的pH值保持在5至8的水平。强盐水流从缓冲容器中连续取出并过滤， 添加铁和硅排出。 此外，用于进行该方法的系统还包括：用于盐的溶解容器，溶解容器中的搅拌器，用于将盐分批供入溶解容器的进料装置，用于将弱盐水供入溶解容器的点， 氯化氢和氯化铁（III）加入到弱盐水供应管线中，用于强盐水的缓冲容器，缓冲容器中的搅拌器，溶解容器和缓冲容器之间的流动连接，具有强盐水出口的过滤器和 用于滤饼的抽出装置，排出口和用于将强盐水从缓冲容器输送到过滤器的装置。
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