公开(公告)号：US06206760B1

公开(公告)日：2001-03-27

申请号：US09342940

申请日：1999-06-29

Applicant: Yu-Chia Chang ,  Jain-Li Wu ,  Chung-I Cheng ,  Chih-Chiang Yang ,  Pei Wei Yeh ,  Yung-Tai Tseng

Inventor： Yu-Chia Chang ,  Jain-Li Wu ,  Chung-I Cheng ,  Chih-Chiang Yang ,  Pei Wei Yeh ,  Yung-Tai Tseng

IPC: B24B100

CPC classification number: B24B37/04 ,  B24B57/02

Abstract: The present invention discloses a method for preventing particle contamination in a polishing machine that utilizes slurry composition for the removal of material from the surface of a substrate. The novel method is particularly suited for use in a chemical mechanical polishing apparatus in which a slurry composition is used. The method includes the step of providing a plurality of cleaning devices each having a bendable, shapable conduit and a spray nozzle for dispensing a cleaning solvent on the spindle and the conditioner arm utilized in the CMP apparatus. The present invention further discloses an apparatus for use in carrying out a method for preventing particle contamination in a CMP apparatus by using bendable, shapable conduits for dispensing a cleaning solvent such as deionized water onto the chamber components for removing slurry deposits that may have splattered thereon and therefore, eliminating sources for particle contamination.

Abstract translation: 本发明公开了一种在抛光机中防止颗粒污染的方法，该方法利用浆料组合物从基材表面除去材料。 该新型方法特别适用于其中使用浆料组合物的化学机械抛光装置。 该方法包括提供多个清洁装置的步骤，每个清洁装置具有可弯曲的成形导管和用于在主体上分配清洁溶剂的喷嘴和用于CMP装置中的调节臂。 本发明还公开了一种用于执行用于防止CMP设备中的颗粒污染的方法的设备，该方法通过使用可弯曲的成型导管将用于将诸如去离子水的清洁溶剂分配到室部件上以除去可能溅在其上的浆料沉积物 因此消除了颗粒污染的来源。

公开(公告)号：US06561877B1

公开(公告)日：2003-05-13

申请号：US09637943

申请日：2000-08-11

Applicant: Chung-Yang Lin ,  Yu-Sheng Shen ,  Young-Wang Lo ,  Chung-I Cheng

Inventor： Chung-Yang Lin ,  Yu-Sheng Shen ,  Young-Wang Lo ,  Chung-I Cheng

IPC: B24B100

CPC classification number: B24B37/34 ,  B24B55/02

Abstract: An apparatus and a method for retaining moisture on a polishing pad in chemical mechanical polishing during machine idling, i.e. during machine maintenance or repair are described. The apparatus is constructed of a circular disc in a clam-shell configuration having two halves for easy mounting or dismounting from a polishing pad. The circular disc may further include a protruded top portion to accommodate a polishing head when the chemical mechanical polishing apparatus is in a stand-by mode. The circular disc should have a diameter sufficiently large to cover an entire surface area of a polishing pad, while a peripheral edge of the circular disc overlaps a periphery of the polishing pad. The apparatus further includes a moisture retention means mounted on an inner surface of the circular disc for providing a moisturizing environment to the surface of the polishing pad. The moisture retention means can be suitably provided in brushes formed of moisture retaining bristles or in a cellulosic material layer. The apparatus may further include a fastening means for fastening the two clam-shell halves together which includes a hook-and-loop means, an adhesive means or a mechanical quick connect/disconnect means. The circular disc is preferably fabricated of a substantially transparent material, such as a transparent plastic, so that the condition of the polishing pad can be readily observed.

Abstract translation: 描述了在机器怠速期间，即在机器维护或修理期间在化学机械抛光中在研磨垫上保持水分的装置和方法。 该装置由蛤壳构造的圆盘构成，具有两个用于容易地从抛光垫安装或拆卸的两半。 当化学机械抛光装置处于待机模式时，圆盘还可以包括突出的顶部以容纳抛光头。 圆盘应该具有足够大的直径以覆盖抛光垫的整个表面区域，而圆盘的周缘与抛光垫的周边重叠。 该装置还包括安装在圆盘的内表面上的保湿装置，用于向抛光垫的表面提供保湿环境。 保湿装置可以适当地设置在由保湿刷毛或由纤维素材料层形成的刷子中。 该装置还可以包括用于将两个蛤壳半部紧固在一起的紧固装置，其包括钩环装置，粘合装置或机械快速连接/断开装置。 圆盘优选地由诸如透明塑料的基本上透明的材料制成，使得可以容易地观察到抛光垫的状况。