Multiple electron beam vacuum vapor deposition apparatus
    2.
    发明授权
    Multiple electron beam vacuum vapor deposition apparatus 失效
    多电子束真空蒸镀装置

    公开(公告)号:US4153005A

    公开(公告)日:1979-05-08

    申请号:US813397

    申请日:1977-07-06

    CPC分类号: H01J37/3053 C23C14/30

    摘要: A vacuum vapor deposition apparatus having a plurality of electron beam sources spaced about the periphery of the molten alloy pool is provided. The electron beam sources have associated therewith focusing and deflection devices for directing each electron beam onto the pool surface opposite its source in the form of an inwardly curved impingement band. These create an approximate toroidal shaped heating pattern to the pool, this pattern providing uniform temperature and minimizing severe thermal gradients therein. As a result, variations in the chemistry of the vapor emanating from the pool are substantially reduced, thereby providing improved control of the as-deposited coating composition. The apparatus is especially useful in vaporizing alloys of complex chemistry, such as coating alloys in the MCrAlY family.

    摘要翻译: 提供了具有围绕熔融合金池的周边隔开的多个电子束源的真空蒸镀装置。 电子束源与其聚焦和偏转装置相关联,用于将每个电子束以向内弯曲的冲击带的形式引导到与其源相反的池表面上。 这些向池中产生近似的环形加热模式,该模式提供均匀的温度并使其中的严重的热梯度最小化。 结果,从池中发出的蒸汽的化学性质的变化显着降低,由此提供对沉积的涂料组合物的改进的控制。 该装置特别适用于汽化复合化学合金,如MCrAlY系列中的涂层合金。