公开(公告)号：US4138298A

公开(公告)日：1979-02-06

申请号：US473303

申请日：1974-05-24

申请人： Wolfgang Bobeth ,  Adolf Heger ,  Helmar Passler ,  Hermann Roloff ,  Ellen Patitz ,  Adolf-Ernst Schwind ,  Erwin Zilinski

发明人： Wolfgang Bobeth ,  Adolf Heger ,  Helmar Passler ,  Hermann Roloff ,  Ellen Patitz ,  Adolf-Ernst Schwind ,  Erwin Zilinski

IPC分类号： D06M14/26 ,  C08J7/18 ,  C08J7/10

CPC分类号： D06M14/26 ,  Y10S8/12 ,  Y10S8/18

摘要： Two basic methods for texturizing or structurizing high-polymer materials are disclosed. One method resides in selectively irradiating a high-polymer material so as to form chemically active species in the material. The material is contacted with a treating medium which reacts with the chemically active species in such a manner as to cause shrinkage of the material. The texturizing or structurizing effects are due to the fact that the irradiated areas of the material will shrink to a different extent in dependence upon the concentration of the chemically active species and/or that the irradiated areas of the material will shrink to a different extent than the non-irradiated areas of the material.

摘要翻译： 公开了用于使高分子材料进行组织化或结构化的两种基本方法。 一种方法是选择性地照射高分子材料以便在材料中形成化学活性物质。 该材料与处理介质接触，处理介质与化学活性物质反应，导致材料收缩。 组织化或结构化效应是由于以下事实：材料的照射区域将根据化学活性物质的浓度而收缩到不同程度，和/或材料的照射区域将收缩到与 材料的未照射区域。

公开(公告)号：US4190623A

公开(公告)日：1980-02-26

申请号：US566334

申请日：1975-04-09

申请人： Wolfgang Bobeth ,  Adolf Heger ,  Helmar Passler ,  Hermann Roloff ,  Ellen Patitz ,  Adolf-Ernst Schwind ,  Erwin Zilinski

发明人： Wolfgang Bobeth ,  Adolf Heger ,  Helmar Passler ,  Hermann Roloff ,  Ellen Patitz ,  Adolf-Ernst Schwind ,  Erwin Zilinski

IPC分类号： D06M14/26 ,  B01D47/00 ,  B01F3/04

CPC分类号： D06M14/26 ,  Y10S8/12 ,  Y10S8/18

摘要： Two basic methods for texturizing or structurizing high-polymer materials are disclosed. One method resides in selectively irradiating a high-polymer material so as to form chemically active species in the material. The material is contacted with a treating medium which reacts with the chemically active species in such a manner as to cause shrinkage of the material. The texturizing or structurizing effects are due to the fact that the irradiated areas of the material will shrink to a different extent in dependence upon the concentration of the chemically active species and/or that the irradiated areas of the material will shrink to a different extent than the nonirradiated areas of the material. The other method resides in homogeneously irradiating a high-polymer material so as to form chemically active species in the material. The chemically active species in certain areas of the material are at least partially destroyed by contacting selected areas of the material with a suitable medium. The material is again contacted with a treating medium which reacts with the chemically active species in such a manner as to cause shrinkage of the material. The texturizing or structurizing effects are due to the fact that those areas of the material where chemically active species are present will shrink to a different extent in dependence upon the concentration of the chemically active species and/or that those areas of the material where chemically active species are present will shrink to a different extent than the areas where no chemically active species are present.

摘要翻译： 公开了用于使高分子材料进行组织化或结构化的两种基本方法。 一种方法是选择性地照射高分子材料以便在材料中形成化学活性物质。 该材料与处理介质接触，处理介质与化学活性物质反应，导致材料收缩。 组织化或结构化效应是由于以下事实：材料的照射区域将根据化学活性物质的浓度而收缩到不同程度，和/或材料的照射区域将收缩到与 材料的非照射区域。 另一种方法是均匀地照射高分子材料以便在材料中形成化学活性物质。 材料的某些区域中的化学活性物质通过使材料的选定区域与合适的介质接触至少部分地被破坏。 该材料再次与以化学活性物质反应的处理介质接触，以使材料收缩。 纹理化或结构化效应是由于存在化学活性物质的材料的那些区域将根据化学活性物质的浓度和/或化学活性物质的那些区域而收缩到不同程度 存在的物种将会收缩到与没有化学活性物质存在的区域不同的程度。