公开(公告)号：US20100127203A1

公开(公告)日：2010-05-27

申请号：US12597340

申请日：2008-04-23

申请人： Tatiana Ulanova ,  Armin Alteheld ,  Klaus Hahn ,  Patrick Deck ,  Meik Ranft ,  Frank Heilmann

发明人： Tatiana Ulanova ,  Armin Alteheld ,  Klaus Hahn ,  Patrick Deck ,  Meik Ranft ,  Frank Heilmann

IPC分类号： E04B1/74 ,  C09K13/00

CPC分类号： C04B35/638 ,  C04B35/14 ,  C04B38/10 ,  C04B2111/00362 ,  C04B2111/52 ,  C04B2201/20 ,  C04B2235/3418 ,  C04B38/0022 ,  C04B38/0058

摘要： A process for producing a silicate foam having a low density, which comprises the following steps: (a) partial hydrolysis of an aqueous dispersion of SiO2 particles which have an average particle diameter in the range from 1 to 100 nm by means of a strong base, (b) addition of a surfactant and a blowing agent and dispersion of the blowing agent at temperatures below 50° C., (c) foaming of the mixture by heating to a temperature in the range from 35 to 100° C. or by depressurization, (d) stabilization of the foam obtained in step c) by means of a hardener, (e) sintering of the foam at a temperature above 500° C.

摘要翻译： 一种低密度硅酸盐泡沫的制造方法，包括以下步骤：（a）通过强碱将平均粒径在1〜100nm范围内的SiO 2颗粒的水分散液部分水解 ，（b）在低于50℃的温度下加入表面活性剂和发泡剂和发泡剂的分散体，（c）通过加热至35℃至100℃的温度或通过 减压，（d）通过硬化剂稳定步骤c）中获得的泡沫，（e）在500℃以上的温度下烧结泡沫。