摘要:
Bodies of hyperpure semiconductor material can be reduced in size without ntamination by being subjected to shock waves. The method is preferably carried out at room temperature, so that diffusion into the interior of the semiconductor, which is induced and/or accelerated by high temperatures, is largely avoided for superficially adsorbed foreign particles. The shock waves are generated in a focal point of a semiellipsoidal reflector by electrical discharge between two electrodes.