公开(公告)号：US20080311837A1

公开(公告)日：2008-12-18

申请号：US11761578

申请日：2007-06-12

申请人： Ching-Cheng Hsu ,  Fu-Tian Chen

发明人： Ching-Cheng Hsu ,  Fu-Tian Chen

IPC分类号： B08B15/02

CPC分类号： B08B15/023 ,  C23C16/4407 ,  H01L21/67017

摘要： The present invention provides a preventive maintenance hood suitable for a reaction chamber of a semiconductor machine and connected to an exhaust pipe. The preventive maintenance hood includes a hood body, an air curtain forming apparatus, and an exhaust pipe connector. The hood body includes a first opening and a second opening. The first opening is located at a bottom of the hood body and adapted to cover an exit of the reaction chamber, while the second opening is located on a sidewall of the hood body. The air curtain forming apparatus is disposed on the hood body and located at an edge of the second opening. The exhaust pipe connector is mounted on the hood body and connected to the exhaust pipe.

摘要翻译： 本发明提供一种适用于半导体机器的反应室并连接到排气管的预防性维护罩。 预防性维护罩包括罩主体，气帘成形装置和排气管连接器。 罩主体包括第一开口和第二开口。 第一开口位于罩主体的底部并且适于覆盖反应室的出口，而第二开口位于罩主体的侧壁上。 气帘形成装置设置在罩主体上并且位于第二开口的边缘。 排气管连接器安装在罩主体上并连接到排气管。