Vacuum treatment apparatus for deposition of thin layers on three-dimensional substrates
    1.
    发明授权
    Vacuum treatment apparatus for deposition of thin layers on three-dimensional substrates 失效
    用于在三维基板上沉积薄层的真空处理设备

    公开(公告)号:US06554980B1

    公开(公告)日:2003-04-29

    申请号:US08951402

    申请日:1997-10-16

    IPC分类号: C23C1434

    CPC分类号: C23C14/566

    摘要: In a vacuum treatment apparatus for deposition of thin layers on shell-shaped substrates (2, 2′, . . . ) with a plurality of treatment stations (8, 9) and airlock stations (10, 20) held by an otherwise closed stationary circular cylindrical vacuum chamber wall (7) and a with rotatably arranged inner wall cylinder (14) which holds the treatment stations (3 through 6) and which inner wall is enclosed by the vacuum chamber wall (7) and in which vacuum chamber wall openings (25, 26, 27, 28) are provided, which openings are capable of overlapping the substrate chambers (3 through 6) and through which openings the treatment agents can act upon the substrates (2, 2′), and with an outer wall (16, 16′) enclosing the vacuum chamber wall, and in which apparatus there are provided two airlock stations (10, 20) which are located diametrically opposite each other and tangentially to the outer wall of the vacuum chamber (7), and to each of these two airlock stations (10, 20) there is assigned a substrate conveyor (19 or 22) which conveyor alternately transports a substrate to the airlock station (10, 20) or away from the airlock station (10, 20), where the loading or unloading of substrates (2, 2′), located at the time in the vicinity of the airlock station, occurs dependent on the rotational motion of the inner cylinder.

    摘要翻译: 在用多个处理站(8,9)和气闸站(10,20)在壳状基板(2,2',...)上沉积薄层的真空处理设备中,所述处理站(10,20)由另外闭合的静止 圆柱形真空室壁(7)和具有可旋转布置的内壁圆筒(14),其保持处理站(3至6),并且该内壁由真空室壁(7)包围,并且其中真空室壁开口 (25,26,27,28),这些开口能够与基板室(3至6)重叠,并且处理剂可以通过哪些开口作用在基板(2,2')上,并且与外壁 (16,16'),其中包括真空室壁,并且其中设置有两个气闸站(10,20),它们彼此沿直径相对并且与真空室(7)的外壁相切,并且 这两个气闸站(10,20)中的每一个都被分配一个子站 该输送机将基板交替地输送到气闸站(10,20)或远离气闸站(10,20),在该输送机(19或22)中,装载或卸载基板(2,2'),位于 在气闸站附近的时间取决于内筒的旋转运动。

    Process for the loading and unloading of an evacuatable treatment
chamber and handling device for carrying out the process
    2.
    发明授权
    Process for the loading and unloading of an evacuatable treatment chamber and handling device for carrying out the process 失效
    用于装载和卸载可抽空处理室和处理装置以进行该过程的方法

    公开(公告)号:US06123494A

    公开(公告)日:2000-09-26

    申请号:US57973

    申请日:1998-04-10

    摘要: A processing station arranged in a vacuum chamber (2) for the coating of workpieces by a device, which loads or empties the workpieces through at least one opening set in the chamber wall (3,3',3") of the vacuum chamber(2) which can be closed off with a cover (14,14'). The loading/unloading device includes a vertically oriented shaft (42), on which a pusher part (26,26') is affixed, which primarily is movable by a lever mechanism through a push/pull connecting rod (40,40'). A gripping device (10,10';11'11') is arranged on the pusher part (26,26') for the transport of the workpieces. Through rotation of the shaft (42), the push/pull connecting rod (40,40') is radially moved between an open position (P.sub.2) of the cover (14,14') near the axle and a closed position (P.sub.1) of the cover (14,14') away from the axle. In the closed position (P.sub.2) of the cover, the gripping device projects completely into the vacuum chamber (2). For the loading of the vacuum chamber (2) with work pieces (8,8'), the pusher part (26,26') is next loaded with the workpieces (8) to be processed. Through subsequent rotation of the loaded pusher part (26,26') about the shaft (42), the pusher part (26,26') is brought in front of the opening (24) of the vacuum chamber (2). Next, the pusher part (26,26') is moved toward the opening by rotation of the shaft (42) in a radial direction, and is closed vacuum tight with the cover (14,14') connected to the pusher part (26,26').

    摘要翻译: 一种设置在真空室(2)中的用于通过装置涂覆工件的处理站,该装置通过设置在真空室的室壁(3,3',3“)中的至少一个开口装载或者清空工件 (2),其可以用盖(14,14')封闭。 装载/卸载装置包括垂直定向的轴(42),其上固定有推动器部分(26,26'),其主要通过杠杆机构通过推/拉连杆(40,40')移动。 夹持装置(10,10'; 11'11')设置在推动器部分(26,26')上用于输送工件。 通过所述轴(42)的旋转,推/拉连杆(40,40')在靠近轴的盖(14,14')的打开位置(P2)和关闭位置(P1)之间径向移动, (14,14')远离轴。 在盖的关闭位置(P2)中,夹持装置完全投射到真空室(2)中。 对于用工件(8,8')装载真空室(2),接下来将推动器部件(26,26')加载待加工的工件(8)。 通过使装载的推动器部件(26,26')围绕轴(42)的随后旋转,推动器部件(26,26')被带到真空室(2)的开口(24)的前方。 接下来,推动器部件(26,26')通过轴(42)沿径向的旋转而朝向开口移动,并且与连接到推动器部件(26)的盖(14,14')真空密封 ,26')。