公开(公告)号：US06220091B1

公开(公告)日：2001-04-24

申请号：US08976961

申请日：1997-11-24

申请人： Fufa Chen ,  Yu Chang ,  Gwo Tzu

发明人： Fufa Chen ,  Yu Chang ,  Gwo Tzu

IPC分类号： G01F2318

CPC分类号： G01F23/168 ,  C23C16/4482

摘要： The present invention provides methods and systems for forming deposition films on semiconductor wafers. In particular, the present invention measures the amount of liquid remaining in a bubbler ampule of a semiconductor processing system used for chemical vapor deposition (CVD) on a semiconductor wafer. More particularly, measurements are made when gas has stopped flowing through the ampule, and the liquid is in a static condition. The system of the present invention comprises a container containing a liquid, a gas inlet for introduction of gas into the liquid, a gas outlet, and a pressure transducer fluidly connected to the gas inlet and the gas outlet. The device measures the amount of liquid in a bubbler ampule through measurements of gas pressure differential between gas exiting a nozzle near the bottom of the liquid and gas located above the level of the liquid. The depth of liquid remaining in the ampule may be extrapolated from the measured pressure differential.

摘要翻译： 本发明提供了在半导体晶片上形成沉积膜的方法和系统。 特别地，本发明测量在半导体晶片上用于化学气相沉积（CVD）的半导体处理系统的起泡器安瓿中剩余的液体量。 更具体地，当气体已经停止流过安瓿并且液体处于静止状态时进行测量。 本发明的系统包括容纳液体的容器，用于将气体引入液体的气体入口，气体出口和与气体入口和气体出口流体连接的压力传感器。 该装置通过测量离开位于液体底部附近的喷嘴的气体和位于液体高度之上的气体之间的气压差来测量起泡器安瓿中的液体量。 保留在安瓿中的液体的深度可以从测量的压力差外推。