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公开(公告)号：US06716564B2
公开(公告)日：2004-04-06
申请号：US10011209
申请日：2001-12-06
IPC分类号： C08F246
CPC分类号： G03F7/0236 , G03F7/0045 , G03F7/0233 , G03F7/038
摘要： A radiation sensitive resin composition containing an alkali-soluble resin, for example a novolak-quinonediazide positive-working radiation sensitive resin composition and a chemically amplified negative-working resin composition, wherein the alkali-soluble resin contains at least an alkali-soluble resin obtained by polycondensation of a compound represented by the following general formula (I) and a phenol if necessary, with an aldehyde. wherein R represents a hydroxyl group or an alkyl group with 1 to 4 carbon atoms, n is 0 or an integer of 1 to 3 and, when n is 2 or 3, each R group may be the same or different.
摘要翻译： 一种含有碱溶性树脂的辐射敏感性树脂组合物，例如酚醛清漆 - 醌二叠氮化物正性辐射敏感树脂组合物和化学放大负性树脂组合物，其中碱溶性树脂至少含有获得的碱溶性树脂 通过由下述通式（I）表示的化合物与苯酚（如果需要）与醛缩聚，其中R表示羟基或碳原子数为1〜4的烷基，n为0或1〜 3，当n为2或3时，每个R基团可以相同或不同。
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公开(公告)号：US06342542B1
公开(公告)日：2002-01-29
申请号：US09600052
申请日：2000-10-12
IPC分类号： C08F246
CPC分类号： G03F7/0236 , G03F7/0045 , G03F7/0233 , G03F7/038
摘要： A radiation sensitive resin composition containing an alkali-soluble resin, for example a novolak-quinonediazide positive-working radiation sensitive resin composition and a chemically amplified negative-working resin composition, wherein the alkali-soluble resin contains at least an alkali-soluble resin obtained by polycondensation of a compound represented by the following general formula (I) and a phenol if necessary, with an aldehyde. wherein R represents a hydroxyl group or an alkyl group with 1 to 4 carbon atoms, n is 0 or an integer of 1 to 3 and, when n is 2 or 3, each R group may be the same or different.
摘要翻译： 一种含有碱溶性树脂的辐射敏感性树脂组合物，例如酚醛清漆 - 醌二叠氮化物正性辐射敏感树脂组合物和化学放大负性树脂组合物，其中碱溶性树脂至少含有获得的碱溶性树脂 通过由下述通式（I）表示的化合物与苯酚（如果需要）与醛缩聚，其中R表示羟基或碳原子数为1〜4的烷基，n为0或1〜 3，当n为2或3时，每个R基团可以相同或不同。
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