公开(公告)号：US20110089505A1

公开(公告)日：2011-04-21

申请号：US12881894

申请日：2010-09-14

申请人： Simon Schneider ,  Andreas Traub ,  Bernd Jahrsdoerfer ,  Holger Rumpf

发明人： Simon Schneider ,  Andreas Traub ,  Bernd Jahrsdoerfer ,  Holger Rumpf

IPC分类号： H01L29/84 ,  H01L21/02

CPC分类号： G01L9/0042 ,  H01L2224/48091 ,  H01L2924/00014

摘要： A sensor component and a method for manufacturing a sensor component, in which a sealing passivation of a sensor layer may be dispensed with. For this purpose, the sensor component includes, in particular, a thin film high-pressure sensor, a deformation body and a piezoresistive sensor layer, which is applied to the deformation body, the piezoresistive sensor layer including at least one metal as well as carbon and/or hydrocarbon and terminating the layer structure of the sensor component. Based on the materials used a sealing cover of the sensor layer by a thin film passivation layer may be dispensed with. Additional contact layers for contacting the sensor layer may advantageously also be dispensed with. Contacting may then take place directly on the sensor layer, using a bond wire.

摘要翻译： 一种传感器部件和用于制造传感器部件的方法，其中可以省去传感器层的密封钝化。 为此，传感器部件特别包括施加到变形体的薄膜高压传感器，变形体和压阻传感器层，压电传感器层包括至少一种金属以及碳 和/或烃，并终止传感器部件的层结构。 基于所使用的材料，可以省略通过薄膜钝化层的传感器层的密封盖。 用于接触传感器层的附加接触层可以有利地也可被省去。 然后可以使用接合线直接在传感器层上进行接触。

公开(公告)号：US20100049310A1

公开(公告)日：2010-02-25

申请号：US12279647

申请日：2007-02-15

申请人： Eckhard Quandt ,  Holger Rumpf ,  Christiane Zamponi ,  Michael Koch

发明人： Eckhard Quandt ,  Holger Rumpf ,  Christiane Zamponi ,  Michael Koch

IPC分类号： A61F2/06 ,  B05D7/00

CPC分类号： A61L27/30 ,  A61F2/91 ,  A61L31/082 ,  C23C30/00

摘要： Method for applying a coating layer to a tubular intraluminal implant, in particular to a vascular support (stent), where the surface of the implant is perforated by a plurality of apertures, and where the coating layer is produced by deposition of material onto the surface of the implant. The implant is first pushed onto a cylindrical holder 4, a sacrificial material, in particular copper, is then deposited onto the surface of the implant until the deposited sacrificial material almost entirely fills the apertures, the coating layer is then deposited onto the surface of the implant provided with sacrificial material, and then the cylindrical holder 4 and the sacrificial material situated in the apertures 3 are removed.

摘要翻译： 将涂层施加到管状腔内植入物，特别是血管支架（支架）上的方法，其中植入物的表面被多个孔打孔，并且其中通过将材料沉积到表面上而产生涂层 的植入物。 首先将植入物推到圆柱形保持器4上，然后将牺牲材料，特别是铜沉积到植入物的表面上，直到沉积的牺牲材料几乎完全填充孔，然后将涂层沉积到 设置有牺牲材料的植入物，然后移除位于孔3中的圆柱形保持器4和牺牲材料。

公开(公告)号：US20090127226A1

公开(公告)日：2009-05-21

申请号：US11912278

申请日：2006-04-24

申请人： Eckhard Quandt ,  Holger Rumpf ,  Christiane Zamponi

发明人： Eckhard Quandt ,  Holger Rumpf ,  Christiane Zamponi

IPC分类号： B44C1/22 ,  A61F2/82 ,  A61B17/58 ,  A61F2/01

CPC分类号： C23C14/0005 ,  A61F2/0077 ,  A61F2/01 ,  A61F2/82 ,  A61F2210/0014 ,  A61F2240/001 ,  A61F2310/00407 ,  A61F2310/00461 ,  A61L27/306 ,  A61L2400/16 ,  C23C14/165 ,  C23F1/26 ,  C23F1/28

摘要： A process for producing a self-supporting layer made of a titanium and nickel alloy with superelastic and/or shape memory properties has the following steps: a substrate entirely or at least mainly made of silicon is provided, a layer of said alloy is applied to a surface of the substrate, the substrate with the desired form is cut out of a wafer or formed by a wafer with the desired form; at least some zones of the lateral surfaces of the substrate adjoining the zones of the surface of the substrate which receive the layer are subjected to an etching process; a layer of said alloy is applied to the surface of the substrate; and the substrate is removed from the applied layer. Also disclosed is a substrate suitable for carrying out the process and an object, in particular an implant, comprising at least one layer produced by this process.

摘要翻译： 制造具有超弹性和/或形状记忆特性的由钛和镍合金制成的自支撑层的方法具有以下步骤：提供完全或至少主要由硅制成的基底，将所述合金层施加到 衬底的表面，具有所需形式的衬底从晶片切割或由具有所需形式的晶片形成; 基板邻接接触层的基板的表面的区域的侧表面的至少一些区域进行蚀刻处理; 将所述合金层施加到基板的表面; 并且从所施加的层去除衬底。 还公开了适用于实施该方法的基材，以及包含至少一个通过该方法生产的层的物体，特别是植入物。