公开(公告)号：US06811957B1

公开(公告)日：2004-11-02

申请号：US09979793

申请日：2002-03-15

申请人： Albert Mau ,  Li-ming Dai ,  Shaoming Huang ,  Yong Yuan Yang ,  Hui Zhu He

发明人： Albert Mau ,  Li-ming Dai ,  Shaoming Huang ,  Yong Yuan Yang ,  Hui Zhu He

IPC分类号： G03F700

CPC分类号： G03F7/40 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/162 ,  C01B2202/08 ,  D01F9/127 ,  H01J2201/30469 ,  Y10S977/843 ,  Y10S977/887 ,  Y10S977/896

摘要： This invention relates to a process for preparing a patterned layer of aligned carbon nanotubes on a substrate including: applying a photoresist layer to at least a portion of a surface of a substrate capable of supporting nanotube growth, masking a region of said photoresist layer to provide a masked portion and an unmasked portion, subjecting said unmasked portion to electromagnetic radiation of a wavelength and intensity sufficient to transform the unmasked portion while leaving the masked portion substantially untransformed, said transformed portion exhibiting solubility characteristics different to said untransformed portion, developing said photoresist layer by contacting with a solvent for a time and under conditions sufficient to dissolve one of said transformed and untransformed portions of the photoresist, leaving the other portion attached to said substrate, synthesising a layer of aligned carbon nanotubes on regions of said substrate to which said remaining photoresist portion is not attached to provide a patterned layer of aligned carbon nanotubes on said substrate.

摘要翻译： 本发明涉及一种在衬底上制备取向碳纳米管的图案化层的方法，包括：将光致抗蚀剂层施加到能够支撑纳米管生长的衬底的表面的至少一部分上，掩蔽所述光致抗蚀剂层的区域以提供 掩模部分和未掩模部分，对所述未掩模部分进行电磁辐射，所述电磁辐射具有足够的波长和强度，以改变未掩蔽部分，同时使掩蔽部分基本上未变形，所述转变部分显示出与所述未变形部分不同的溶解度特性，使所述光致抗蚀剂层显影 通过与溶剂接触一段时间并在足以溶解光致抗蚀剂的所述转变和未转化部分之一的条件下，将另一部分连接到所述基底上，在所述基底的区域上合成对准的碳纳米管层，所述剩余部分 光刻胶口 离子不连接以在所述衬底上提供对准的碳纳米管的图案化层。