公开(公告)号：US06171353B2

公开(公告)日：2001-01-09

申请号：US09072535

申请日：1998-05-04

申请人： Young-bae Park ,  Hyung-ryul Kim

发明人： Young-bae Park ,  Hyung-ryul Kim

IPC分类号： B01D4518

CPC分类号： B01D45/18

摘要： Disclosed is an apparatus for effectively treating waste gases which are discharged during a processing of manufacturing semiconductors. The apparatus for treating waste gases according to an embodiment of the present invention comprises a waste gases heating chamber, a waste gases collecting chamber, a waste gases collecting chamber cover, a scraping device for the waste gases collecting chamber cover, a scraping device for the waste gases collecting chamber, and a driving source for driving the scraping device for the waste gases collecting chamber cover, and the scraping device for the waste gases collecting chamber. The apparatus for treating waste gases further includes a cooling tube which is disposed on an outer surface of the waste gases collecting chamber, for cooling waste gases.

摘要翻译： 公开了一种有效处理在制造半导体的加工过程中排出的废气的装置。 根据本发明实施例的用于处理废气的设备包括废气加热室，废气收集室，废气收集室盖，用于废气收集室盖的刮擦装置，用于 废气收集室，以及用于驱动废气收集室盖的刮除装置的驱动源和废气收集室的刮除装置。 用于处理废气的设备还包括设置在废气收集室的外表面上用于冷却废气的冷却管。