公开(公告)号：US07569178B2

公开(公告)日：2009-08-04

申请号：US11418733

申请日：2006-05-05

申请人： Seung Soo Hong ,  Yong Hyeon Shin ,  Kwang Hwa Chung ,  In Tae Lim

发明人： Seung Soo Hong ,  Yong Hyeon Shin ,  Kwang Hwa Chung ,  In Tae Lim

IPC分类号： G01D18/00 ,  C21D11/00

CPC分类号： G01L27/005 ,  C21D11/00

摘要： An apparatus and method for in-situ calibration of a vacuum gauge by absolute method and comparison method, which can carry out absolute calibration using a static type standard for measuring pressures of vacuum chambers by expanding and moving gas between four vacuum chambers of different volumes in order, and comparison calibration of vacuum gauges in an in-situ state without movement of the vacuum gauges according to a method for controlling gas flow through an orifice using a calibrated standard vacuum gauge. Thus, the absolute calibration and the comparative calibration of the vacuum gauges which have been separately carried out by different apparatuses till now can be carried out by just one apparatus, whereby economical efficiency and convenience in calibration of vacuum gauges are maximized.

摘要翻译： 一种用于通过绝对方法和比较方法原位校准真空计的装置和方法，其可以使用静态标准进行绝对校准，以通过在不同体积的四个真空室之间扩张和移动气体来测量真空室的压力 根据用于通过使用校准的标准真空计来控制通过孔口的气体流量的方法，真空计的原位状态的顺序和比较校准，而不移动真空计。 因此，仅通过一个装置可以进行到目前为止由各种装置分别进行的真空计的绝对校准和比较校准，由此真空计的校准的经济性和便利性最大化。

公开(公告)号：US20070108671A1

公开(公告)日：2007-05-17

申请号：US11418733

申请日：2006-05-05

申请人： Seung Soo Hong ,  Yong Hyeon Shin ,  Kwang Hwa Chung ,  In Tae Lim

发明人： Seung Soo Hong ,  Yong Hyeon Shin ,  Kwang Hwa Chung ,  In Tae Lim

IPC分类号： G01D18/00 ,  C21D11/00

CPC分类号： G01L27/005 ,  C21D11/00

摘要： Disclosed therein is apparatus and method for in-situ calibration of a vacuum gauge by absolute method and comparison method, which can carry out absolute calibration using a static type standard for measuring pressures of vacuum chambers by expanding and moving gas to the vacuum chambers of different volumes in order and comparison calibration of vacuum gauges in an in-situ state without movement of the vacuum gauges according to a method for controlling gas flow through an orifice using a calibrated standard vacuum gauge. The present invention includes a technology for combining an absolute calibration of a standard vacuum gauge by a static method and a comparative calibration of a vacuum gauge by a method for controlling a gas flow through an orifice, technologies for generating and calibrating standard pressure from a low vacuum to a high vacuum, and a technology of comparative calibration of the vacuum gauge by a method for stabilizing the gas flow through the orifice. So, the absolute calibration and the comparative calibration of the vacuum gauges which have been separately carried out by different apparatuses till now can be carried out by just one apparatus, whereby economical efficiency and convenience in calibration of vacuum gauges are maximized.

摘要翻译： 其中公开了一种用于通过绝对方法和比较方法原位校准真空计的装置和方法，其可以使用静态标准进行绝对校准，用于通过将气体扩展和移动到不同的真空室来测量真空室的压力 根据用于通过校准的标准真空计控制通过孔口的气体流量的方法，在原位状态下的真空计的体积以及真空计的比较校准，而不会移动真空计。 本发明包括通过静态方法对标准真空计的绝对校准和通过用于控制通过孔口的气体流量的方法的真空计的比较校准进行组合的技术，用于从低温产生和校准标准压力的技术 通过用于稳定通过孔的气体流量的方法，真空至真空的真空，以及真空计的比较校准技术。 因此，仅通过一个装置可以进行到目前为止由各种装置分别进行的真空计的绝对校准和比较校准，由此真空计的校准的经济性和便利性最大化。