公开(公告)号：US08568962B2

公开(公告)日：2013-10-29

申请号：US12936896

申请日：2009-04-07

Applicant: Ko Hermans ,  Itsuro Tomatsu ,  Rintje Pieter Sijbesma ,  Cornelis Wilhelmus Maria Bastiaansen ,  Jan Dirk Broer

Inventor： Ko Hermans ,  Itsuro Tomatsu ,  Rintje Pieter Sijbesma ,  Cornelis Wilhelmus Maria Bastiaansen ,  Jan Dirk Broer

IPC: G03F7/38

CPC classification number: G03F7/36 ,  G03F7/027 ,  G03F7/38

Abstract: The invention relates to a photo-embossing process for the preparation of a polymeric relief structure comprising the steps of: a) coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients and less than 30 wt % polymeric binder material; b) locally treating the coated substrate with electromagnetic radiation having a periodic, non-periodic or random radiation-intensity pattern, forming a latent image, at a temperature below a transition temperature of the coating composition; and c) polymerizing and/or crosslinking the resulting coated substrate, at a temperature above said transition temperature, wherein the transition temperature is a temperature that defines a transition of the coating composition between a state of high viscosity and low viscosity and wherein the coating composition comprises a compound A comprising at least one radiation curable group and a photoinitiator, the coating composition having a transition temperature between 30° C. and 120° C.

Abstract translation: 本发明涉及一种用于制备聚合物浮雕结构的光压印方法，包括以下步骤：a）用包含一种或多种辐射敏感成分和小于30wt％聚合物粘合剂材料的涂料组合物涂覆基材; b）在低于涂层组合物的转变温度的温度下，用具有周期性，非周期性或随机辐射强度图案的电磁辐射局部处理涂覆的基底，形成潜像; 和c）在高于所述转变温度的温度下聚合和/或交联所得涂覆的基材，其中所述转变温度是限定所述涂料组合物在高粘度和低粘度状态之间的转变的温度，并且其中所述涂料组合物 包含包含至少一种可辐射固化基团和光引发剂的化合物A，该涂料组合物的转变温度在30℃至120℃之间。

公开(公告)号：US20110104445A1

公开(公告)日：2011-05-05

申请号：US12936896

申请日：2009-04-07

Applicant: Ko Hermans ,  Itsuro Tomatsu ,  Rintje Pieter Sijbesma ,  Cornelis Wilhelmus Maria Bastiaansen ,  Jan Dirk Broer

Inventor： Ko Hermans ,  Itsuro Tomatsu ,  Rintje Pieter Sijbesma ,  Cornelis Wilhelmus Maria Bastiaansen ,  Jan Dirk Broer

IPC: B32B3/30 ,  G03F7/20

CPC classification number: G03F7/36 ,  G03F7/027 ,  G03F7/38

Abstract: The invention relates to a photo-embossing process for the preparation of a polymeric relief structure comprising the steps of: a) coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients and less than 30 wt % polymeric binder material; b) locally treating the coated substrate with electromagnetic radiation having a periodic, non-periodic or random radiation-intensity pattern, forming a latent image, at a temperature below a transition temperature of the coating composition; and c) polymerizing and/or crosslinking the resulting coated substrate, at a temperature above said transition temperature, wherein the transition temperature is a temperature that defines a transition of the coating composition between a state of high viscosity and low viscosity and wherein the coating composition comprises a compound A comprising at least one radiation curable group and a photoinitiator, the coating composition having a transition temperature between 30° C. and 120° C.

Abstract translation: 本发明涉及一种用于制备聚合物浮雕结构的光压印方法，包括以下步骤：a）用包含一种或多种辐射敏感成分和小于30wt％聚合物粘合剂材料的涂料组合物涂覆基材; b）在低于涂层组合物的转变温度的温度下，用具有周期性，非周期性或随机辐射强度图案的电磁辐射局部处理涂覆的基底，形成潜像; 和c）在高于所述转变温度的温度下聚合和/或交联所得涂覆的基材，其中所述转变温度是限定所述涂料组合物在高粘度和低粘度状态之间的转变的温度，并且其中所述涂料组合物 包含包含至少一种可辐射固化基团和光引发剂的化合物A，该涂料组合物的转变温度在30℃至120℃之间。