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公开(公告)号:US08765359B2
公开(公告)日:2014-07-01
申请号:US13489099
申请日:2012-06-05
申请人: Andres Fernandez , Shaunak Roy , Jay Shafto , Norman L. Burns , Claudia Richter , Pierre F. Indermuhle
发明人: Andres Fernandez , Shaunak Roy , Jay Shafto , Norman L. Burns , Claudia Richter , Pierre F. Indermuhle
IPC分类号: G03F7/26
摘要: Methods of preparing organosilane-functionalized regions on a substrate surface and more specifically fabricating patterned functionalized substrates suitable to be optically read, the methods generally comprising employing a vapor deposition process of an organosilane gas onto a lithographically patterned silicon surface followed by removal of the patterning media in a bath of organic solvents and ultrasonic excitation. The inventive methods provide optimized surface density of functional species while avoiding deleterious effects that can occur when lithographically patterned substrates are exposed to various gaseous species during the functionalization process.
摘要翻译: 在衬底表面上制备有机硅烷官能化区域的方法,更具体地制备适于光学读取的图案化官能化衬底的方法,所述方法通常包括将有机硅烷气体的气相沉积工艺应用于光刻图案化的硅表面,随后除去图案形成介质 在有机溶剂和超声波激发浴中。 本发明的方法提供功能物质的优化的表面密度,同时避免当在功能化过程中将光刻图案化的基底暴露于各种气态物质时可能发生的有害影响。
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公开(公告)号:US20130323652A1
公开(公告)日:2013-12-05
申请号:US13489099
申请日:2012-06-05
申请人: Andres Fernandez , Shaunak Roy , Jay Shafto , Norman L. Burns , Claudia Richter , Pierre F. Indermuhle
发明人: Andres Fernandez , Shaunak Roy , Jay Shafto , Norman L. Burns , Claudia Richter , Pierre F. Indermuhle
摘要: Methods of preparing organosilane-functionalized regions on a substrate surface and more specifically fabricating patterned functionalized substrates suitable to be optically read, the methods generally comprising employing a vapor deposition process of an organosilane gas onto a lithographically patterned silicon surface followed by removal of the patterning media in a bath of organic solvents and ultrasonic excitation. The inventive methods provide optimized surface density of functional species while avoiding deleterious effects that can occur when lithographically patterned substrates are exposed to various gaseous species during the functionalization process.
摘要翻译: 在衬底表面上制备有机硅烷官能化区域的方法,更具体地制备适于光学读取的图案化官能化衬底的方法,所述方法通常包括将有机硅烷气体的气相沉积工艺应用于光刻图案化的硅表面,随后除去图案形成介质 在有机溶剂和超声波激发浴中。 本发明的方法提供功能物质的优化的表面密度,同时避免当在功能化过程中将光刻图案化的基底暴露于各种气态物质时可能发生的有害影响。
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