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1.发明申请公开(公告)号：US20070045573A1
公开(公告)日：2007-03-01
申请号：US11504957
申请日：2006-08-16
IPC分类号： G01J3/10
摘要： The invention is directed to an arrangement for generating EUV radiation based on a gas discharge plasma with high radiation emission in the range between 12 nm and 14 nm. It is the object of the invention to find a novel possibility for plasma-based radiation generation with high radiation output in the EUV spectral region (between 12 nm and 14 nm) which makes it possible to use tin as a work medium in EUV gas discharge sources for industrial applications. This object is met, according to the invention, in that a gas preparation unit is provided for defined control of the temperature and pressure of a tin-containing work medium and the flow thereof into the vacuum chamber in gaseous state. At least one thermally insulated reservoir vessel and a thermally insulated supply line are provided for transferring the gaseous tin-containing work medium from the gas preparation unit to the pre-ionization unit located inside the electrode housing.
摘要翻译： 本发明涉及一种基于具有12nm至14nm范围内的高辐射发射的气体放电等离子体产生EUV辐射的装置。 本发明的目的是在EUV光谱区（12nm和14nm）之间找到具有高辐射输出的等离子体辐射产生的新颖可能性，这使得可以使用锡作为EUV气体放电中的工作介质 工业应用来源。 根据本发明，满足本发明的目的在于提供一种气体制备单元，用于限定含锡工作介质的温度和压力及其在气态下进入真空室的流量。 提供至少一个隔热储存器容器和绝热供应管线，用于将气态含锡工作介质从气体制备单元转移到位于电极壳体内的预电离单元。
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2.发明授权公开(公告)号：US07414253B2
公开(公告)日：2008-08-19
申请号：US11504957
申请日：2006-08-16
IPC分类号： H01J65/04
摘要： The invention is directed to an arrangement for generating EUV radiation based on a gas discharge plasma with high radiation emission in the range between 12 nm and 14 nm. It is the object of the invention to find a novel possibility for plasma-based radiation generation with high radiation output in the EUV spectral region (between 12 nm and 14 nm) which makes it possible to use tin as a work medium in EUV gas discharge sources for industrial applications. This object is met, according to the invention, in that a gas preparation unit is provided for defined control of the temperature and pressure of a tin-containing work medium and the flow thereof into the vacuum chamber in gaseous state. At least one thermally insulated reservoir vessel and a thermally insulated supply line are provided for transferring the gaseous tin-containing work medium from the gas preparation unit to the pre-ionization unit located inside the electrode housing.
摘要翻译： 本发明涉及一种基于具有12nm至14nm范围内的高辐射发射的气体放电等离子体产生EUV辐射的装置。 本发明的目的是在EUV光谱区（12nm和14nm）之间找到具有高辐射输出的等离子体辐射产生的新颖可能性，这使得可以使用锡作为EUV气体放电中的工作介质 工业应用来源。 根据本发明，满足本发明的目的在于提供一种气体制备单元，用于限定含锡工作介质的温度和压力及其在气态下进入真空室的流量。 提供至少一个隔热储存器容器和绝热供应管线，用于将气态含锡工作介质从气体制备单元转移到位于电极壳体内的预电离单元。
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