Reducing power in SRAMs while maintaining cell stability
    1.
    发明申请
    Reducing power in SRAMs while maintaining cell stability 审中-公开
    降低SRAM中的电源,同时保持电池稳定性

    公开(公告)号:US20060133135A1

    公开(公告)日:2006-06-22

    申请号:US11017981

    申请日:2004-12-20

    IPC分类号: G11C11/00

    CPC分类号: G11C11/417

    摘要: An SRAM with reduced power consumption comprising N SRAM cells and peripheral circuitry that enables writing and reading any of the N SRAM cells. The number of cells, N, is a whole number. The voltage applied to the N SRAM cells is higher than the voltage applied to the peripheral circuitry.

    摘要翻译: 具有降低功耗的SRAM,包括N个SRAM单元和能够写入和读取任何N个SRAM单元的外围电路。 单元格数N是整数。 施加到N个SRAM单元的电压高于施加到外围电路的电压。

    Reduced bitline leakage current
    3.
    发明申请
    Reduced bitline leakage current 审中-公开
    减少位线漏电流

    公开(公告)号:US20070081409A1

    公开(公告)日:2007-04-12

    申请号:US11234480

    申请日:2005-09-23

    IPC分类号: G11C5/14

    摘要: A method for reducing power in an SRAM is achieved by applying a first voltage to all bitlines of a section of the SRAM in standby operation and applying a second voltage to all the bitlines of a section of the SRAM in normal operation. The first voltage is not greater than the second voltage.

    摘要翻译: 通过在待机操作中对SRAM的一部分的所有位线施加第一电压并且在正常操作中对SRAM的一部分的所有位线施加第二电压来实现用于降低SRAM中的功率的方法。 第一电压不大于第二电压。

    Layout design process and system for providing bypass capacitance and compliant density in an integrated circuit
    4.
    发明授权
    Layout design process and system for providing bypass capacitance and compliant density in an integrated circuit 有权
    在集成电路中提供旁路电容和兼容密度的布局设计过程和系统

    公开(公告)号:US06775812B2

    公开(公告)日:2004-08-10

    申请号:US10197346

    申请日:2002-07-17

    IPC分类号: G06F1750

    CPC分类号: H01L27/0203

    摘要: An IC layout design process and system involves placing an adjustable capacitor cell having a plurality of sub-cells, each with a polysilicon shape disposed over a corresponding active area shape. The polysilicon shapes are electrically coupled to a first power rail and the active area shapes are electrically coupled to a second power rail. The sub-cells of the adjustable capacitor cell are operable to be modified to satisfy a density measurement associated with the IC's fabrication flow.

    摘要翻译: IC布局设计过程和系统涉及放置具有多个子单元的可调节电容器单元,每个子单元具有设置在相应的有源区域形状上的多晶硅形状。 多晶硅形状电耦合到第一电力轨道,并且有源区域形状电耦合到第二电力轨道。 可调节电容器单元的子单元可操作以被修改以满足与IC制造流程相关联的密度测量。