公开(公告)号：US08423928B2

公开(公告)日：2013-04-16

申请号：US13271194

申请日：2011-10-11

申请人： Justin Ghan ,  Abdurrahman Sezginer

发明人： Justin Ghan ,  Abdurrahman Sezginer

IPC分类号： G06F17/50

CPC分类号： G03F7/70466 ,  G03F1/70

摘要： Some embodiments provide a method for optimally decomposing patterns within particular spatial regions of interest on a particular layer of a design layout for a multi-exposure photolithographic process. Specifically, some embodiments model the spatial region using a mathematical equation in terms of two or more intensities. Some embodiments then optimize the model across a set of feasible intensities. The optimization yields a set of intensities such that the union of the patterns created/printed from each exposure intensity most closely approximates the patterns within the particular regions. Based on the set of intensities, some embodiments then determine a decomposition solution for the patterns that satisfies design constraints of a multi-exposure photolithographic printing process. In this manner, some embodiments achieve an optimal photolithographic printing of the particular regions of interest without performing geometric rule based decomposition.

摘要翻译： 一些实施例提供了一种用于在用于多曝光光刻工艺的设计布局的特定层上的特定空间区域内最佳分解图案的方法。 具体地，一些实施例使用两个或更多个强度的数学方程来建模空间区域。 一些实施例然后在一组可行的强度上优化模型。 优化产生一组强度，使得从每个曝光强度创建/打印的图案的并集最接近于特定区域内的图案。 基于强度集合，一些实施例然后确定满足多曝光光刻印刷处理的设计约束的图案的分解解。 以这种方式，一些实施例在不执行基于几何规则的分解的情况下实现特定感兴趣区域的最佳光刻印刷。

公开(公告)号：US20100037200A1

公开(公告)日：2010-02-11

申请号：US12189692

申请日：2008-08-11

申请人： Justin Ghan ,  Abdurrahman Sezginer

发明人： Justin Ghan ,  Abdurrahman Sezginer

IPC分类号： G06F17/50

CPC分类号： G03F7/70466 ,  G03F1/70

摘要： Some embodiments provide a method for optimally decomposing patterns within particular spatial regions of interest on a particular layer of a design layout for a multi-exposure photolithographic process. Specifically, some embodiments model the spatial region using a mathematical equation in terms of two or more intensities. Some embodiments then optimize the model across a set of feasible intensities. The optimization yields a set of intensities such that the union of the patterns created/printed from each exposure intensity most closely approximates the patterns within the particular regions. Based on the set of intensities, some embodiments then determine a decomposition solution for the patterns that satisfies design constraints of a multi-exposure photolithographic printing process. In this manner, some embodiments achieve an optimal photolithographic printing of the particular regions of interest without performing geometric rule based decomposition.

摘要翻译： 一些实施例提供了一种用于在用于多曝光光刻工艺的设计布局的特定层上的特定空间区域内最佳分解图案的方法。 具体地，一些实施例使用两个或更多个强度的数学方程来建模空间区域。 一些实施例然后在一组可行的强度上优化模型。 优化产生一组强度，使得从每个曝光强度创建/打印的图案的并集最接近于特定区域内的图案。 基于强度集合，一些实施例然后确定满足多曝光光刻印刷处理的设计约束的图案的分解解。 以这种方式，一些实施例在不执行基于几何规则的分解的情况下实现特定感兴趣区域的最佳光刻印刷。

公开(公告)号：US20120102442A1

公开(公告)日：2012-04-26

申请号：US13271194

申请日：2011-10-11

申请人： Justin Ghan ,  Abdurrahman Sezginer

发明人： Justin Ghan ,  Abdurrahman Sezginer

IPC分类号： G06F17/50

CPC分类号： G03F7/70466 ,  G03F1/70

摘要： Some embodiments provide a method for optimally decomposing patterns within particular spatial regions of interest on a particular layer of a design layout for a multi-exposure photolithographic process. Specifically, some embodiments model the spatial region using a mathematical equation in terms of two or more intensities. Some embodiments then optimize the model across a set of feasible intensities. The optimization yields a set of intensities such that the union of the patterns created/printed from each exposure intensity most closely approximates the patterns within the particular regions. Based on the set of intensities, some embodiments then determine a decomposition solution for the patterns that satisfies design constraints of a multi-exposure photolithographic printing process. In this manner, some embodiments achieve an optimal photolithographic printing of the particular regions of interest without performing geometric rule based decomposition.

摘要翻译： 一些实施例提供了一种用于在用于多曝光光刻工艺的设计布局的特定层上的特定空间区域内最佳分解图案的方法。 具体地，一些实施例使用两个或更多个强度的数学方程来建模空间区域。 一些实施例然后在一组可行的强度上优化模型。 优化产生一组强度，使得从每个曝光强度创建/打印的图案的并集最接近于特定区域内的图案。 基于强度集合，一些实施例然后确定满足多曝光光刻印刷处理的设计约束的图案的分解解。 以这种方式，一些实施例在不执行基于几何规则的分解的情况下实现特定感兴趣区域的最佳光刻印刷。

公开(公告)号：US08069423B2

公开(公告)日：2011-11-29

申请号：US12189692

申请日：2008-08-11

申请人： Justin Ghan ,  Abdurrahman Sezginer

发明人： Justin Ghan ,  Abdurrahman Sezginer

IPC分类号： G06F17/50

CPC分类号： G03F7/70466 ,  G03F1/70

摘要： Some embodiments provide a method for optimally decomposing patterns within particular spatial regions of interest on a particular layer of a design layout for a multi-exposure photolithographic process. Specifically, some embodiments model the spatial region using a mathematical equation in terms of two or more intensities. Some embodiments then optimize the model across a set of feasible intensities. The optimization yields a set of intensities such that the union of the patterns created/printed from each exposure intensity most closely approximates the patterns within the particular regions. Based on the set of intensities, some embodiments then determine a decomposition solution for the patterns that satisfies design constraints of a multi-exposure photolithographic printing process. In this manner, some embodiments achieve an optimal photolithographic printing of the particular regions of interest without performing geometric rule based decomposition.

摘要翻译： 一些实施例提供了一种用于在用于多曝光光刻工艺的设计布局的特定层上的特定空间区域内最佳分解图案的方法。 具体地，一些实施例使用两个或更多个强度的数学方程来建模空间区域。 一些实施例然后在一组可行的强度上优化模型。 优化产生一组强度，使得从每个曝光强度创建/打印的图案的并集最接近于特定区域内的图案。 基于强度集合，一些实施例然后确定满足多曝光光刻印刷处理的设计约束的图案的分解解。 以这种方式，一些实施例在不执行基于几何规则的分解的情况下实现特定感兴趣区域的最佳光刻印刷。