公开(公告)号：US07239939B2

公开(公告)日：2007-07-03

申请号：US11110845

申请日：2005-04-21

申请人： Hidehiko Mori ,  Yoshiyuki Tomita ,  Kazutoshi Sakaki

发明人： Hidehiko Mori ,  Yoshiyuki Tomita ,  Kazutoshi Sakaki

IPC分类号： G06F7/00

CPC分类号： H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67751 ,  Y10S414/136 ,  Y10S414/139

摘要： The present invention provides a vacuum stage device that moves a substrate to be processed in a vacuum environment. In a substrate transfer device in accordance with the present invention, a wafer mounted to a wafer platen is moved in a vacuum processing chamber. This substrate transfer device includes a first driving mechanism for moving the wafer platen in a Y1 direction, and a second driving mechanism that is provided in the vacuum processing chamber and linearly reciprocates the wafer platen in X1 and X2 directions at a high speed.

摘要翻译： 本发明提供一种在真空环境中移动待处理基板的真空级装置。 在根据本发明的衬底转移装置中，将安装到晶片压板的晶片在真空处理室中移动。 该基板转印装置包括用于沿Y 1方向移动晶片压板的第一驱动机构和设置在真空处理室中的第二驱动机构，并且以高速度在X 1和X 2方向上使晶片压板线性地往复运动 。

公开(公告)号：US06925355B2

公开(公告)日：2005-08-02

申请号：US10228047

申请日：2002-08-27

申请人： Hidehiko Mori ,  Yoshiyuki Tomita ,  Kazutoshi Sakaki

发明人： Hidehiko Mori ,  Yoshiyuki Tomita ,  Kazutoshi Sakaki

IPC分类号： G12B5/00 ,  B65G49/07 ,  F15B15/14 ,  H01L21/027 ,  H01L21/677 ,  H01L21/68 ,  G06F7/00

CPC分类号： H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67751 ,  Y10S414/136 ,  Y10S414/139

摘要： The present invention provides a vacuum stage device that moves a substrate to be processed in a vacuum environment. In a substrate transfer device in accordance with the present invention, a wafer mounted to a wafer platen is moved in a vacuum processing chamber. This substrate transfer device includes a first driving mechanism for moving the wafer platen in a Y1 direction, and a second driving mechanism that is provided in the vacuum processing chamber and linearly reciprocates the wafer platen in X1 and X2 directions at a high speed.

公开(公告)号：US20050187653A1

公开(公告)日：2005-08-25

申请号：US11110845

申请日：2005-04-21

申请人： Hidehiko Mori ,  Yoshiyuki Tomita ,  Kazutoshi Sakaki

发明人： Hidehiko Mori ,  Yoshiyuki Tomita ,  Kazutoshi Sakaki

IPC分类号： G12B5/00 ,  B65G49/07 ,  F15B15/14 ,  H01L21/027 ,  H01L21/677 ,  H01L21/68 ,  G06F7/00

CPC分类号： H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67751 ,  Y10S414/136 ,  Y10S414/139

摘要： The present invention provides a vacuum stage device that moves a substrate to be processed in a vacuum environment. In a substrate transfer device in accordance with the present invention, a wafer mounted to a wafer platen is moved in a vacuum processing chamber. This substrate transfer device includes a first driving mechanism for moving the wafer platen in a Y1 direction, and a second driving mechanism that is provided in the vacuum processing chamber and linearly reciprocates the wafer platen in X1 and X2 directions at a high speed.

摘要翻译： 本发明提供一种在真空环境中移动待处理基板的真空级装置。 在根据本发明的衬底转移装置中，将安装到晶片压板的晶片在真空处理室中移动。 该基板转印装置包括用于沿Y 1方向移动晶片压板的第一驱动机构和设置在真空处理室中的第二驱动机构，并且以高速度在X 1和X 2方向上使晶片压板线性地往复运动 。

公开(公告)号：US06789457B2

公开(公告)日：2004-09-14

申请号：US10241761

申请日：2002-09-12

申请人： Kazutoshi Sakaki ,  Fuminori Makino

发明人： Kazutoshi Sakaki ,  Fuminori Makino

IPC分类号： F15B903

CPC分类号： F15B9/09

摘要： A controlling and computing device performs the steps of: differentiating a slider position represented by a position detection signal fed from a position sensor, and calculating the velocity of the slider, differentiating the calculated velocity so as to calculate an acceleration: using a slider target position, the slider position, the velocity and the acceleration to calculate position instruction values to be fed to two servo amplifiers; performing a computation on the respectively calculated position instruction values, so as to compensate for a pressure change which has occurred in each of pressure chambers due to a change in the position of a pressure receiving plate in a cylinder chamber; and producing the respectively compensated position instruction values to the two servo amplifiers.

摘要翻译： 控制和计算装置执行以下步骤：区分由位置传感器馈送的位置检测信号表示的滑块位置，并计算滑块的速度，区分计算出的速度以便计算加速度：使用滑块目标位置 ，滑块位置，速度和加速度，以计​​算要馈送到两个伺服放大器的位置指令值; 对分别计算的位置指令值执行计算，以补偿由于气缸室中的受压板的位置的变化而在每个压力室中发生的压力变化; 并向两个伺服放大器产生分别补偿的位置指令值。

公开(公告)号：US06779432B2

公开(公告)日：2004-08-24

申请号：US10241760

申请日：2002-09-12

申请人： Kazutoshi Sakaki

发明人： Kazutoshi Sakaki

IPC分类号： F15B903

CPC分类号： F15B11/0426 ,  F15B11/048 ,  F15B2211/3057 ,  F15B2211/30575 ,  F15B2211/327 ,  F15B2211/6336 ,  F15B2211/6346 ,  F15B2211/6654 ,  F15B2211/7054 ,  F15B2211/75

摘要： An air pressure actuator has a partition wall provided on one of a slider and a guide shaft to form two cylinder chambers between the guide shaft and the slider. Intake/exhaust systems are connected with the two cylinder chambers for supplying a compressed air into the cylinder chambers or discharging the same therefrom. Two servo valves including a large capacity servo valve and a small capacity servo valve are respectively connected with the intake/exhaust systems. A position detector for detecting the position of the slider is provided on the slider. A control device receives the detection results of the position detector and a position instruction value, to select the large capacity servo valve or the small capacity servo valve in accordance with an acceleration or deceleration zone and a constant speed zone of the slider, and to control an opening degree of a selected servo valve.

摘要翻译： 空气压力致动器具有设置在滑块和引导轴中的一个上的分隔壁，以在引导轴和滑块之间形成两个气缸室。 进气/排气系统与两个气缸室连接，用于将压缩空气供应到气缸室中或从其排出。 包括大容量伺服阀和小容量伺服阀的两个伺服阀分别与进/排系统连接。 在滑块上设置有用于检测滑块位置的位置检测器。 控制装置接收位置检测器的检测结果和位置指示值，根据滑块的加速或减速区域和恒定速度区域选择大容量伺服阀或小容量伺服阀，并且控制 所选择的伺服阀的开度。