公开(公告)号：US5401604A

公开(公告)日：1995-03-28

申请号：US188712

申请日：1994-01-31

申请人： Chikayuki Otsuka ,  Mamoru Seio ,  Kiyomi Sakurai ,  Kazuyuki Kawamura

发明人： Chikayuki Otsuka ,  Mamoru Seio ,  Kiyomi Sakurai ,  Kazuyuki Kawamura

IPC分类号： G03F7/023 ,  G03F7/16

CPC分类号： G03F7/0233 ,  G03F7/164

摘要： A positive-type photosensitive resin composition containing a resin which results from reactions between a specific polyepoxide compound, a carboxylic acid compound having a specific phenolic hydroxyl group, a carboxylic acid compound having no specific phenolic hydroxyl group, and 1,2-quinone diazide sulfonyl halide. The resin composition has high exposure sensitivity, is capable of inhibiting swell or dissolution of unexposed areas during the stage of development, and yet retains other favorable properties. The resin composition has also attained short developing time.

摘要翻译： 含有由特定聚环氧化合物，具有特定酚羟基的羧酸化合物，不具有特定酚羟基的羧酸化合物与1,2-醌二叠氮基磺酰基之间的反应产生的树脂的正型感光性树脂组合物 卤化物。 该树脂组合物具有高的曝光灵敏度，能够在显影阶段抑制未曝光区域的溶胀或溶解，并且还保留其它有利的性质。 树脂组合物也具有短的显影时间。