公开(公告)号：US4801208A

公开(公告)日：1989-01-31

申请号：US901587

申请日：1986-08-29

申请人： Kinya Katoh ,  Toshio Matsuura

发明人： Kinya Katoh ,  Toshio Matsuura

IPC分类号： G03F9/00 ,  H01L21/30 ,  G01B11/27

CPC分类号： G03F9/7076 ,  H01L21/30

摘要： Alignment of a mask with a projection-type exposing apparatus and alignment of the mask with a substrate are provided. Plural exposure areas of the substrate are exposed by light of a predetermined wavelength, which is also used for alignment purposes to reduce alignment error due to aberration of a projection optical system. A first alignment mark is disposed in a first area between adjacent exposure areas of the substrate. The mask has a main area, a second area in which a second mark is disposed, and a third area in which a third mark is disposed, the second area being outside of the main area and the third area being inside the second area. An illuminating device has a first status in which the second and third areas are illuminated simultaneously and has a second status in which the third area is illuminated, a first area adjacent to one of the exposure areas also being illuminated when the illuminating device has the second status. In the first status, a first detector detects the position of an image of the second mark formed by an objective optical system. In the second status, a second detector detects displacement between images of the first and third marks formed by the objective optical system and produces a detection signal. The mask is displaced relative to the substrate in response to the detection signal, so that the images of the first and third marks assume a predetermined relationship.

摘要翻译： 提供掩模与投影型曝光装置的对准以及掩模与基板的对准。 基板的多个曝光区域被预定波长的光曝光，其也用于对准目的，以减少由于投影光学系统的像差引起的对准误差。 第一对准标记设置在基板的相邻曝光区域之间的第一区域中。 掩模具有主区域，设置有第二标记的第二区域和设置有第三标记的第三区域，第二区域在主区域外部，第三区域在第二区域内。 照明装置具有第一状态，其中第二和第三区域同时被照亮，并且具有其中第三区域被照亮的第二状态，当照明装置具有第二区域时，与曝光区域中的一个相邻的第一区域也被照亮 状态。 在第一状态下，第一检测器检测由物镜光学系统形成的第二标记的图像的位置。 在第二状态下，第二检测器检测由物镜光学系统形成的第一和第三标记的图像之间的位移，并产生检测信号。 响应于检测信号，掩模相对于基板移位，使得第一和第三标记的图像呈现预定关系。

公开(公告)号：US4710029A

公开(公告)日：1987-12-01

申请号：US796785

申请日：1985-11-12

申请人： Kinya Katoh

发明人： Kinya Katoh

IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/00

CPC分类号： G03F9/7076 ,  H01L21/30

摘要： A projection type exposing apparatus includes a projection objective for projecting the image of a reticle having a predetermined pattern and a plurality of alignment marks onto a wafer, photoelectric alignment means having an imaging optical system for forming the images of the alignment marks on the reticle, a photoelectric detecting slit member disposed at a predetermined image position of the imaging optical system, and a slit image displacing optical member disposed in the optical path of the imaging optical system to optically displace the image position of the slit member on the reticle in a direction perpendicular to the lengthwise direction of the slit member, the slit member being designed such that the lengthwise direction thereof is coincident with a straight line intersecting the optic axis of the projection objective on the reticle, a movable stage for supporting the wafer thereon for movement relative to the projection objective, and a reference index mark member provided on the movable stage to set the reference position of the slit member in the photoelectric alignment means relative to the movable stage.

摘要翻译： 投影式曝光装置包括投影物镜，用于将具有预定图案和多个对准标记的掩模版的图像投影到晶片上，光电对准装置具有用于在掩模版上形成对准标记的图像的成像光学系统， 设置在成像光学系统的预定图像位置处的光电检测狭缝部件和设置在成像光学系统的光路中的狭缝图像位移光学部件，以将光罩上的狭缝部件的图像位置沿着方向 垂直于狭缝部件的长度方向的狭缝部件被设计成使得其长度方向与与掩模版上的投影物镜的光轴相交的直线重合，用于将晶片支撑在其上的可移动台架相对运动 提供投影物镜，并且参考指示标记构件提供 d设置在可动台上，以使光电对准装置中的狭缝部件相对于可移动台的基准位置。