公开(公告)号：US5245528A

公开(公告)日：1993-09-14

申请号：US435911

申请日：1990-03-20

申请人： Tadayoshi Saito ,  Kohji Tachibana ,  Susumu Takahashi ,  Nobuyuki Yokokawa ,  Masahide Nomura ,  Hiroshi Matsumoto ,  Makoto Shimoda ,  Hisanori Miyagaki ,  Eiji Tohyama

发明人： Tadayoshi Saito ,  Kohji Tachibana ,  Susumu Takahashi ,  Nobuyuki Yokokawa ,  Masahide Nomura ,  Hiroshi Matsumoto ,  Makoto Shimoda ,  Hisanori Miyagaki ,  Eiji Tohyama

IPC分类号： G05B13/02

CPC分类号： G05B13/0275 ,  Y10S706/90

摘要： A process control apparatus and a process control system for observing the waveform of the deviation between a set point which controls the process in a control loop and the process controlled variable transmitted from the process so that the operating parameters are adjusted in accordance with a predetermined adjustment rule by using the deviation based upon the absolute value of a wave for every half cycle of the wave. Therefore, even if the process controlled variable is influenced, the area of the wave cannot be changed significantly. As a result, the operating parameters can be adjusted correctly, causing the process controlled variable to quickly coincide with the set point.

摘要翻译： 一种过程控制装置和过程控制系统，用于观察控制控制回路中的过程的设定点与从过程发送的过程控制变量之间的偏差的波形，使得根据预定调整来调整操作参数 通过使用基于波的每半个周期的波的绝对值的偏差来规定。 因此，即使过程控制变量受到影响，波的面积也不会发生显着变化。 因此，可以正确调整运行参数，使过程控制变量与设定值快速一致。