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公开(公告)号:US20110048936A1
公开(公告)日:2011-03-03
申请号:US12861330
申请日:2010-08-23
申请人: Toshihiro KUGIMIYA , Katsutoshi Takagi , Hitoshi Matsuzaki , Kotaro Kitashita , Yoichiro Yoneda
发明人: Toshihiro KUGIMIYA , Katsutoshi Takagi , Hitoshi Matsuzaki , Kotaro Kitashita , Yoichiro Yoneda
IPC分类号: C23C14/14
CPC分类号: C22C1/0416 , B22F2003/248 , B22F2998/10 , B22F2999/00 , C22C21/00 , C23C14/3414 , B22F9/082 , B22F3/1208 , B22F3/15 , B22F3/17 , B22F3/18 , B22F3/24 , B22F2201/02
摘要: An Al-base alloy sputtering target consisting Ni and one or more rare earth elements, wherein there are 5.0×104/mm2 or more compounds whose aspect ratio is 2.5 or higher and whose equivalent diameter is 0.2 μm or larger, when a cross sectional surface perpendicular to the plane of the target is observed at a magnification of 2000 or higher.
摘要翻译: 包含Ni和一种或多种稀土元素的Al基合金溅射靶,其中当纵横比为2.5以上且当量为0.2μm以上的化合物的截面为5.0×10 4 / mm 2以上时, 以2000或更高的放大倍率观察垂直于靶平面的平面。
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公开(公告)号:US07803238B2
公开(公告)日:2010-09-28
申请号:US11341531
申请日:2006-01-30
申请人: Toshihiro Kugimiya , Katsutoshi Takagi , Hitoshi Matsuzaki , Kotaro Kitashita , Yoichiro Yoneda
发明人: Toshihiro Kugimiya , Katsutoshi Takagi , Hitoshi Matsuzaki , Kotaro Kitashita , Yoichiro Yoneda
IPC分类号: C22C21/00
CPC分类号: C22C1/0416 , B22F2003/248 , B22F2998/10 , B22F2999/00 , C22C21/00 , C23C14/3414 , B22F9/082 , B22F3/1208 , B22F3/15 , B22F3/17 , B22F3/18 , B22F3/24 , B22F2201/02
摘要: An Al-base alloy sputtering target consisting Ni and one or more rare earth elements, wherein there are 5.0×104/mm2 or more compounds whose aspect ratio is 2.5 or higher and whose equivalent diameter is 0.2 μm or larger, when a cross sectional surface perpendicular to the plane of the target is observed at a magnification of 2000 or higher.
摘要翻译: 包含Ni和一种或多种稀土元素的Al基合金溅射靶,其中当纵横比为2.5以上且当量为0.2μm以上的化合物的截面为5.0×10 4 / mm 2以上时, 以2000或更高的放大倍率观察垂直于靶平面的平面。
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公开(公告)号:US08172961B2
公开(公告)日:2012-05-08
申请号:US12861330
申请日:2010-08-23
申请人: Toshihiro Kugimiya , Katsutoshi Takagi , Hitoshi Matsuzaki , Kotaro Kitashita , Yoichiro Yoneda
发明人: Toshihiro Kugimiya , Katsutoshi Takagi , Hitoshi Matsuzaki , Kotaro Kitashita , Yoichiro Yoneda
IPC分类号: C23C14/14
CPC分类号: C22C1/0416 , B22F2003/248 , B22F2998/10 , B22F2999/00 , C22C21/00 , C23C14/3414 , B22F9/082 , B22F3/1208 , B22F3/15 , B22F3/17 , B22F3/18 , B22F3/24 , B22F2201/02
摘要: An Al-base alloy sputtering target consisting Ni and one or more rare earth elements, wherein there are 5.0×104/mm2 or more compounds whose aspect ratio is 2.5 or higher and whose equivalent diameter is 0.2 μm or larger, when a cross sectional surface perpendicular to the plane of the target is observed at a magnification of 2000 or higher.
摘要翻译: 包含Ni和一种或多种稀土元素的Al基合金溅射靶,其中当纵横比为2.5以上且当量为0.2μm以上的化合物的截面为5.0×10 4 / mm 2以上时, 以2000或更高的放大倍率观察垂直于靶平面的平面。
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公开(公告)号:US20060180250A1
公开(公告)日:2006-08-17
申请号:US11341531
申请日:2006-01-30
申请人: Toshihiro Kugimiya , Katsutoshi Takagi , Hitoshi Matsuzaki , Kotaro Kitashita , Yoichiro Yoneda
发明人: Toshihiro Kugimiya , Katsutoshi Takagi , Hitoshi Matsuzaki , Kotaro Kitashita , Yoichiro Yoneda
IPC分类号: C22C21/00
CPC分类号: C22C1/0416 , B22F2003/248 , B22F2998/10 , B22F2999/00 , C22C21/00 , C23C14/3414 , B22F9/082 , B22F3/1208 , B22F3/15 , B22F3/17 , B22F3/18 , B22F3/24 , B22F2201/02
摘要: An Al-base alloy sputtering target consisting Ni and one or more rare earth elements, wherein there are 5.0×104/mm2 or more compounds whose aspect ratio is 2.5 or higher and whose equivalent diameter is 0.2 μm or larger, when a cross sectional surface perpendicular to the plane of the target is observed at a magnification of 2000 or higher.
摘要翻译: 包含Ni和一种或多种稀土元素的Al基合金溅射靶,其中有5.0×10 4 / mm 2以上的长宽比为2.5或更高的化合物 当等效直径为0.2μm或更大时,当以2000或更高的倍率观察垂直于靶平面的横截面时。
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