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公开(公告)号:US07026629B2
公开(公告)日:2006-04-11
申请号:US10328174
申请日:2002-12-26
IPC分类号: H01J35/00
CPC分类号: B82Y10/00 , G03F7/70033 , G03F7/70908
摘要: A lithographic apparatus includes a first space containing a plasma source and also containing a source gas which may have a high absorption of radiation at the wavelength of the projection beam of the apparatus, this gas being restricted from entering the remainder of the lithographic system by a second space containing a buffer gas having a low absorption at the wavelength of the projection beam of the apparatus. The pressure of the buffer gas is lower than or equal to that of the source gas.