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公开(公告)号:US5250740A
公开(公告)日:1993-10-05
申请号:US818384
申请日:1992-01-09
申请人: Kevin J. Mackey , Anthony W. Vere , Donald C. Bradley , Daro M. Frigo , Marc M. Faktor, deceased
发明人: Kevin J. Mackey , Anthony W. Vere , Donald C. Bradley , Daro M. Frigo , Marc M. Faktor, deceased
CPC分类号: C23C16/30
摘要: A method for forming a layer of a Group II or III fluoride on a semiconductor substrate (e.g. as epitaxial insulating layer) comprising vaporising a precursor (I), where M is Be, Ca, Sr, Ba or lanthanide, b and d are 0 or 1. A, B, C and D are independently (IIA) or (IIB), X being O, S, NR, PR where R is H, alkyl, perfluoroalkyl; Y is perfluoroalkyl, fluoroalkenyl, fluoroalkylamine or fluoroalkenylamine; Z is H, F, alkyl, perfluoroalkyl or perfluoroalkenyl; and then decomposing the precursor vapor to form M fluoride. A preferred precursor for CaF.sub.2 is a calcium 1,1,1,5,5,5-hexafluor-2,4-pentanedione complex where b and d are 0.
摘要翻译: 一种用于在半导体衬底(例如作为外延绝缘层)上形成II或III族氟化物层的方法,包括蒸发前体(I),其中M为Be,Ca,Sr,Ba或镧系元素,b和d为0 或A,B,C和D独立地为(IIA)或(IIB),X为O,S,NR,PR,其中R为H,烷基,全氟烷基; Y是全氟烷基,氟烯基,氟烷基胺或氟链烯基胺; Z是H,F,烷基,全氟烷基或全氟链烯基; 然后分解前体蒸气形成氟化物。 CaF2的优选前体是1,1,1,5,5,5-六氟-2,4-戊二酮络合物,其中b和d为0。
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公开(公告)号:US5116785A
公开(公告)日:1992-05-26
申请号:US619831
申请日:1990-11-30
申请人: Kevin J. Mackey , Anthony W. Vere , Donald C. Bradley , Dario M. Frigo , Marc M. Faktor, deceased
发明人: Kevin J. Mackey , Anthony W. Vere , Donald C. Bradley , Dario M. Frigo , Marc M. Faktor, deceased
IPC分类号: C30B29/12 , C07F3/04 , C23C16/30 , C30B25/02 , H01L21/205 , H01L21/314 , H01L21/84 , H01L27/12
CPC分类号: C23C16/30
摘要: A method for forming a layer of a Group II or III fluoride on a semiconductor substrate (e.g. as epitaxial insulating layer) comprising vaporizing a precursor (I), where M is Be, Ca, Sr, Ba or lanthanide, b and d are 0 or 1. A, B, C and D are independently (IIA) or (IIB), X being O, S, NR, PR where R is H, alkyl, perfluoroalkyl; Y is perfluoroalkyl, fluoroalkenyl, fluoroalkylamine or fluoroalkenylamine; Z is H, F, alkyl, perfluoroalkyl or perfluoroalkenyl; and then decomposing the precursor vapor to form M fluoride. A preferred precursor for calcium fluoride is calcium 1,1,1,5,5,5-hexafluor-2,4-pentanedione complex where b and d are 0.
摘要翻译: 一种用于在半导体衬底(例如作为外延绝缘层)上形成II或III族氟化物层的方法,包括使M为Be,Ca,Sr,Ba或镧系元素的b,d为M的前体(I) 或A,B,C和D独立地为(IIA)或(IIB),X为O,S,NR,PR,其中R为H,烷基,全氟烷基; Y是全氟烷基,氟烯基,氟烷基胺或氟链烯基胺; Z是H,F,烷基,全氟烷基或全氟链烯基; 然后分解前体蒸气形成氟化物。 氟化钙的优选前体是1,1,1,5,5,5-六氟-2,4-戊二酮络合物,其中b和d为0。
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