Precursors for metal fluoride deposition and use thereof
    1.
    发明授权
    Precursors for metal fluoride deposition and use thereof 失效
    金属氟化物沉积的前体及其用途

    公开(公告)号:US5250740A

    公开(公告)日:1993-10-05

    申请号:US818384

    申请日:1992-01-09

    IPC分类号: C23C16/30 C07C45/77

    CPC分类号: C23C16/30

    摘要: A method for forming a layer of a Group II or III fluoride on a semiconductor substrate (e.g. as epitaxial insulating layer) comprising vaporising a precursor (I), where M is Be, Ca, Sr, Ba or lanthanide, b and d are 0 or 1. A, B, C and D are independently (IIA) or (IIB), X being O, S, NR, PR where R is H, alkyl, perfluoroalkyl; Y is perfluoroalkyl, fluoroalkenyl, fluoroalkylamine or fluoroalkenylamine; Z is H, F, alkyl, perfluoroalkyl or perfluoroalkenyl; and then decomposing the precursor vapor to form M fluoride. A preferred precursor for CaF.sub.2 is a calcium 1,1,1,5,5,5-hexafluor-2,4-pentanedione complex where b and d are 0.

    摘要翻译: 一种用于在半导体衬底(例如作为外延绝缘层)上形成II或III族氟化物层的方法,包括蒸发前体(I),其中M为Be,Ca,Sr,Ba或镧系元素,b和d为0 或A,B,C和D独立地为(IIA)或(IIB),X为O,S,NR,PR,其中R为H,烷基,全氟烷基; Y是全氟烷基,氟烯基,氟烷基胺或氟链烯基胺; Z是H,F,烷基,全氟烷基或全氟链烯基; 然后分解前体蒸气形成氟化物。 CaF2的优选前体是1,1,1,5,5,5-六氟-2,4-戊二酮络合物,其中b和d为0。

    Method of depositing metal fluoride
    2.
    发明授权
    Method of depositing metal fluoride 失效
    沉积金属氟化物的方法

    公开(公告)号:US5116785A

    公开(公告)日:1992-05-26

    申请号:US619831

    申请日:1990-11-30

    CPC分类号: C23C16/30

    摘要: A method for forming a layer of a Group II or III fluoride on a semiconductor substrate (e.g. as epitaxial insulating layer) comprising vaporizing a precursor (I), where M is Be, Ca, Sr, Ba or lanthanide, b and d are 0 or 1. A, B, C and D are independently (IIA) or (IIB), X being O, S, NR, PR where R is H, alkyl, perfluoroalkyl; Y is perfluoroalkyl, fluoroalkenyl, fluoroalkylamine or fluoroalkenylamine; Z is H, F, alkyl, perfluoroalkyl or perfluoroalkenyl; and then decomposing the precursor vapor to form M fluoride. A preferred precursor for calcium fluoride is calcium 1,1,1,5,5,5-hexafluor-2,4-pentanedione complex where b and d are 0.

    摘要翻译: 一种用于在半导体衬底(例如作为外延绝缘层)上形成II或III族氟化物层的方法,包括使M为Be,Ca,Sr,Ba或镧系元素的b,d为M的前体(I) 或A,B,C和D独立地为(IIA)或(IIB),X为O,S,NR,PR,其中R为H,烷基,全氟烷基; Y是全氟烷基,氟烯基,氟烷基胺或氟链烯基胺; Z是H,F,烷基,全氟烷基或全氟链烯基; 然后分解前体蒸气形成氟化物。 氟化钙的优选前体是1,1,1,5,5,5-六氟-2,4-戊二酮络合物,其中b和d为0。