公开(公告)号：US06642728B1

公开(公告)日：2003-11-04

申请号：US09744825

申请日：2001-05-11

申请人： Masami Kudo ,  Toshio Kazama ,  Yoshio Yamada ,  Kazushi Watanabe

发明人： Masami Kudo ,  Toshio Kazama ,  Yoshio Yamada ,  Kazushi Watanabe

IPC分类号： G01R3102

CPC分类号： H01L21/67242 ,  G01R1/067

摘要： The holder for an electroconductive contact unit according to the present invention uses a silicon wafer having a laminated structure including a first silicon layer, second silicon layer and silicon oxide film which is disposed between the two silicon layers. A small hole is formed in the first silicon layer for coaxially and slidably guiding a head portion of an electroconductive needle member, and a large hole is formed in the second silicon layer for receiving a flange portion of the needle member and a compression coil spring so that the silicon oxide film serves as a stopper for the flange member. Thus, by finishing the surface of the first silicon layer by lapping, the projecting length of the electroconductive needle member can be defined at a high precision. When the object to be tested consists of a silicon wafer, because the holder is made of the same material as the object to be tested, and they undergo a substantial identical thermal expansion, there is no positional shifting of each electroconductive needle member in simultaneously accessing a plurality of points.

摘要翻译： 根据本发明的用于导电接触单元的保持器使用具有层叠结构的硅晶片，其包括设置在两个硅层之间的第一硅层，第二硅层和氧化硅膜。 在第一硅层中形成一个小孔，用于同轴且可滑动地引导导电针构件的头部，并且在第二硅层中形成大孔，用于容纳针构件的凸缘部分和压缩螺旋弹簧 氧化硅膜用作凸缘构件的止动件。 因此，通过研磨完成第一硅层的表面，可以高精度地定义导电针构件的突出长度。 当要测试的对象由硅晶片组成时，由于保持器由与被测试对象相同的材料制成，并且它们经历基本上相同的热膨胀，所以每个导电针构件不会同时进入位置移动 多个点。