GATE VALVE AND SUBSTRATE PROCESSING APPARATUS EQUIPPED WITH THE SAME
    1.
    发明申请
    GATE VALVE AND SUBSTRATE PROCESSING APPARATUS EQUIPPED WITH THE SAME 有权
    门阀和底板加工设备配备

    公开(公告)号:US20120055400A1

    公开(公告)日:2012-03-08

    申请号:US13258519

    申请日:2010-03-29

    IPC分类号: H01L21/00 B05C9/00 F16K3/00

    CPC分类号: F16K51/02 F16K1/24 F16K1/443

    摘要: Agate valve apparatus is disclosed. The gate valve apparatus is provided with a valve casing that includes a first valve seat and a second valve seat, and in which an opening portion is formed; and a closure element that includes a sealing member that contacts the first valve seat to seal the opening portion. In addition, the gate valve apparatus is provided with a shutoff member that contacts the second valve seat to thereby be deformed, so that a space between the opening portion and a sealing member is shut off by the shutoff member when the closure element closes the opening portion. The shutoff member is deformed and continues to contact the second valve seat under normal and high temperature environments when the closure element closes the opening portion.

    摘要翻译: 公开了玛盖特阀装置。 闸阀装置设置有包括第一阀座和第二阀座的阀壳体,其中形成有开口部分; 以及闭合元件,其包括接触所述第一阀座以密封所述开口部的密封构件。 此外,闸阀装置设置有与第二阀座接触从而变形的切断构件,使得当闭合元件闭合开口时,通过关闭构件将开口部和密封构件之间的空间切断 一部分。 当闭合元件关闭开口部分时,关闭构件变形并在正常和高温环境下继续接触第二阀座。

    Thermal processing apparatus
    2.
    发明授权
    Thermal processing apparatus 失效
    热处理设备

    公开(公告)号:US6040120A

    公开(公告)日:2000-03-21

    申请号:US14485

    申请日:1998-01-28

    CPC分类号: H01L21/0274 G03F7/38

    摘要: A substrate processing apparatus and a thermal processing apparatus are capable of creating a pattern with an excellent line width uniformity. An ACU conditions air to a temperature and a humidity which are suitable to processing which uses a resist of chemical thickening type, while an ammonia removing filter removes an ammonia component from the air and the air is supplied to an air supply pipe which branches off. A pump, a flow meter and a pressure regulator are disposed to an air supply pipe, so that the air from the ACU, as it is conditioned to flow at a constant flow rate and with a pressure, is supplied to a PEB bake unit. Since the temperature and the humidity of an atmosphere within the PEB bake unit stabilize at values which are suitable to processing which uses a resist of chemical thickening type, it is possible to form a pattern with an excellent line width uniformity. At the same time, it is possible to suppress a development failure since the atmosphere contains a reduced quantity of ammonia component.

    摘要翻译: 基板处理装置和热处理装置能够产生具有优异的线宽均匀性的图案。 ACU将空气调节到适合于使用化学增稠型抗蚀剂的加工的温度和湿度,而氨除去过滤器从空气中除去氨成分,并将空气供给到分支的空气供给管。 将泵,流量计和压力调节器设置在供气管上,使得来自ACU的空气被调节为以恒定的流量和压力流动,供给到PEB烘烤单元。 由于PEB烘烤单元内的气氛的温度和湿度稳定在适合于使用化学增稠型抗蚀剂的处理的值,因此可以形成具有优异的线宽均匀性的图案。 同时,可以抑制显影失败,因为气氛含有较少量的氨成分。

    Gate valve and substrate processing apparatus equipped with the same
    3.
    发明授权
    Gate valve and substrate processing apparatus equipped with the same 有权
    闸阀及其配备的基板处理装置

    公开(公告)号:US08590861B2

    公开(公告)日:2013-11-26

    申请号:US13258519

    申请日:2010-03-29

    IPC分类号: F16K25/00

    CPC分类号: F16K51/02 F16K1/24 F16K1/443

    摘要: A gate valve apparatus is disclosed. The gate valve apparatus is provided with a valve casing that includes a first valve seat and a second valve seat, and in which an opening portion is formed; and a closure element that includes a sealing member that contacts the first valve seat to seal the opening portion. In addition, the gate valve apparatus is provided with a shutoff member that contacts the second valve seat to thereby be deformed, so that a space between the opening portion and a sealing member is shut off by the shutoff member when the closure element closes the opening portion. The shutoff member is deformed and continues to contact the second valve seat under normal and high temperature environments when the closure element closes the opening portion.

    摘要翻译: 公开了一种闸阀装置。 闸阀装置设置有包括第一阀座和第二阀座的阀壳体,其中形成有开口部分; 以及闭合元件,其包括接触所述第一阀座以密封所述开口部的密封构件。 此外,闸阀装置设置有与第二阀座接触从而变形的切断构件,使得当闭合元件闭合开口时,通过关闭构件将开口部和密封构件之间的空间切断 一部分。 当闭合元件关闭开口部分时,关闭构件变形并在正常和高温环境下继续接触第二阀座。