Electronic component and electronic device
    1.
    发明申请
    Electronic component and electronic device 有权
    电子元器件及电子元器件

    公开(公告)号:US20060193103A1

    公开(公告)日:2006-08-31

    申请号:US11347367

    申请日:2006-02-06

    IPC分类号: H01G4/228

    摘要: An electronic component comprises an element body, and a terminal electrode disposed on the element body. The terminal electrode has a first electrode layer, a second electrode layer, and a third electrode layer. The first electrode layer is formed on an external surface of the element body and formed by baking of a conductive paste. The second electrode layer is formed by Ni plating on the first electrode layer. The third electrode layer is formed by Sn plating or Sn alloy plating on the second electrode layer. A thickness of the second electrode layer is set in a range of not less than 5 μm, and less than 8 μm.

    摘要翻译: 电子部件包括元件主体和设置在元件主体上的端子电极。 端子电极具有第一电极层,第二电极层和第三电极层。 第一电极层形成在元件体的外表面上,并通过烘烤导电膏形成。 在第一电极层上通过Ni电镀形成第二电极层。 第三电极层通过在第二电极层上的Sn电镀或Sn合金镀层形成。 第二电极层的厚度设定在5μm以上且小于8μm的范围内。

    Electronic component and electronic device
    2.
    发明授权
    Electronic component and electronic device 有权
    电子元器件及电子元器件

    公开(公告)号:US07339781B2

    公开(公告)日:2008-03-04

    申请号:US11347367

    申请日:2006-02-06

    IPC分类号: H01G4/228

    摘要: An electronic component having an element body, and a terminal electrode disposed on the element body. The terminal electrode has a first electrode layer, a second electrode layer, and a third electrode layer. The first electrode layer is formed on an external surface of the element body and formed by baking of a conductive paste. The second electrode layer is formed by Ni plating on the first electrode layer. The third electrode layer is formed by Sn plating or Sn alloy plating on the second electrode layer. A thickness of the second electrode layer is set in a range of not less than 5 μm, and less than 8 μm.

    摘要翻译: 具有元件主体的电子部件和设置在元件主体上的端子电极。 端子电极具有第一电极层,第二电极层和第三电极层。 第一电极层形成在元件体的外表面上,并通过烘烤导电膏形成。 在第一电极层上通过Ni电镀形成第二电极层。 第三电极层通过在第二电极层上的Sn电镀或Sn合金镀层形成。 第二电极层的厚度设定在5μm以上且小于8μm的范围内。