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1.发明授权Optical article having a temperature-resistant anti-reflection coating with optimized thickness ratio of low index and high index layers 有权具有耐低温抗反射涂层的光学制品，具有优化的低折射率和高折射率层厚度比公开(公告)号：US07692855B2
公开(公告)日：2010-04-06
申请号：US11427199
申请日：2006-06-28
申请人： Frédéric Arrouy , Olivier Beinat , Luc Nouvelot , Michèle Thomas
发明人： Frédéric Arrouy , Olivier Beinat , Luc Nouvelot , Michèle Thomas
IPC分类号： G02B1/10
摘要： The present invention relates to an optical article having anti-reflection properties and high thermal resistance, comprising a substrate having at least one main face coated with a multi-layer anti-reflection coating comprising a stack of at least one high refractive index layer and at least one low refractive index layer, wherein the ratio: R T = sum of the physical thicknesses of the low refractive index layers of the anti - reflection coating sum of the physical thicknesses of the high refractive index layers of the anti - reflection coating is higher than 2.1. If the anti-reflection stack comprises at least one low refractive index layer having a physical thickness ≧100 nm which is not the outermost layer of the anti-reflection coating, said relatively thick layer and the underlying layers are not taken into account in RT calculation.
摘要翻译： 本发明涉及具有抗反射性能和高耐热性的光学制品，其包括具有涂覆有多层抗反射涂层的至少一个主面的基底，该多层抗反射涂层包括至少一层高折射率层和 至少一个低折射率层，其中所述比率：RT =所述硬件的实际厚度的总和 高反倾销é厚度的总体情况 涂层高于2.1。 如果抗反射堆叠包括物理厚度≥100nm的至少一个低折射率层，其不是抗反射涂层的最外层，则在RT计算中不考虑所述相对厚的层和下层 。
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2.发明授权Method for producing an optical article coated with an antireflection or a reflective coating having improved adhesion and abrasion resistance properties 有权用于制造涂有抗反射的光学制品的方法或具有改善的粘合性和耐磨性的反射涂层公开(公告)号：US08318245B2
公开(公告)日：2012-11-27
申请号：US12036060
申请日：2008-02-22
申请人： Philippe Roisin , Michèle Thomas
发明人： Philippe Roisin , Michèle Thomas
IPC分类号： B05D5/06
摘要： The invention relates to a method for producing an optical article having antireflection or reflective properties and comprising a substrate having at least one main surface, comprising the step of depositing an sub-layer onto a substrate's main surface, the step of treating the sub-layer by ionic bombardment and the step of depositing onto said sub-layer a multilayered stack comprising at least one high refractive index layer and at least one low refractive index layer. According to a preferred embodiment, the deposition of the sub-layer is conducted in a vacuum chamber in which a gas is supplied during the deposition step.
摘要翻译： 本发明涉及一种具有抗反射性能的光学制品的制造方法，其特征在于，具有至少具有一个主表面的基板，其特征在于，具有在基板的主表面上设置副层的工序， 通过离子轰击和在所述子层上沉积包括至少一个高折射率层和至少一个低折射率层的多层叠层的步骤。 根据优选实施例，子层的沉积在沉积步骤中在其中供应气体的真空室中进行。
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