Antireflective Coatings for Via Fill and Photolithography Applications and Methods of Preparation Thereof
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    发明申请
    Antireflective Coatings for Via Fill and Photolithography Applications and Methods of Preparation Thereof 审中-公开
    用于通孔填充和光刻的抗反射涂层及其制备方法

    公开(公告)号:US20120001135A1

    公开(公告)日:2012-01-05

    申请号:US13217706

    申请日:2011-08-25

    IPC分类号: C09K3/00

    摘要: An absorbing composition is described herein that includes at least one inorganic-based compound, at least one absorbing compound, and at least one material modification agent. In addition, methods of making an absorbing composition are also described that includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, an acid/water mixture, and one or more solvents to form a reaction mixture; and b) allowing the reaction mixture to form the absorbing composition at room temperature. Another method of making an absorbing composition includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, an acid/water mixture, and one or more solvents to form a reaction mixture; and b) heating the reaction mixture to form the absorbing composition. Yet another method of making an absorbing composition is described that includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, and one or more solvents to form a reaction mixture, wherein the at least one material modification agent comprises at least one acid and water; and b) heating the reaction mixture to form an absorbing material, a coating or a film. In other methods of making an absorbing composition described herein, those methods include: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, and one or more solvents to form a reaction mixture, wherein the at least one material modification agent comprises at least one acid and water; and b) allowing the reaction mixture to form an absorbing material, a coating or a film.

    摘要翻译: 本文描述的吸收组合物包括至少一种无机基化合物,至少一种吸收化合物和至少一种材料改性剂。 此外,还描述了制备吸收组合物的方法,其包括:a)将至少一种无机基化合物,至少一种吸收化合物,至少一种材料改性剂,酸/水混合物和一种或多种溶剂 形成反应混合物; 和b)使反应混合物在室温下形成吸收组合物。 制备吸收组合物的另一种方法包括:a)将至少一种无机基化合物,至少一种吸收化合物,至少一种材料改性剂,酸/水混合物和一种或多种溶剂组合以形成反应混合物; 和b)加热反应混合物以形成吸收组合物。 描述了制备吸收组合物的另一种方法,其包括:a)将至少一种无机基化合物,至少一种吸收化合物,至少一种材料改性剂和一种或多种溶剂组合以形成反应混合物,其中 至少一种材料改性剂包含至少一种酸和水; 和b)加热反应混合物以形成吸收材料,涂层或膜。 在制备本文所述的吸收组合物的其它方法中,这些方法包括:a)将至少一种无机基化合物,至少一种吸收化合物,至少一种材料改性剂和一种或多种溶剂组合以形成反应混合物, 其中所述至少一种材料改性剂包含至少一种酸和水; 和b)使反应混合物形成吸收材料,涂层或膜。