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公开(公告)号:US20130292795A1
公开(公告)日:2013-11-07
申请号:US13590079
申请日:2012-08-20
申请人: Chang-Soo Pyon , Min-Ho Ko , Hyun-Chol Bang , Kwang-Min Kim , Won-Kyu Kwak
发明人: Chang-Soo Pyon , Min-Ho Ko , Hyun-Chol Bang , Kwang-Min Kim , Won-Kyu Kwak
IPC分类号: H01L29/02
CPC分类号: H01L27/124 , H01L23/5223 , H01L27/1255 , H01L28/40
摘要: A semiconductor device includes a substrate, a first conductive layer on the substrate and including a main pattern, and substantially symmetrical auxiliary patterns extending from two sides of the main pattern, an insulating layer on the substrate and the first conductive layer, and a second conductive layer on the insulating layer and overlapping at least a portion of the main pattern and the auxiliary patterns.
摘要翻译: 半导体器件包括衬底,衬底上的第一导电层和主图案,以及从主图案的两侧延伸的基本对称的辅助图案,衬底上的绝缘层和第一导电层,以及第二导电层 层,并且与主图案和辅助图案的至少一部分重叠。
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公开(公告)号:US09659970B2
公开(公告)日:2017-05-23
申请号:US13590079
申请日:2012-08-20
申请人: Chang-Soo Pyon , Min-Ho Ko , Hyun-Chol Bang , Kwang-Min Kim , Won-Kyu Kwak
发明人: Chang-Soo Pyon , Min-Ho Ko , Hyun-Chol Bang , Kwang-Min Kim , Won-Kyu Kwak
IPC分类号: H01L29/00 , H01L27/12 , H01L23/522 , H01L49/02
CPC分类号: H01L27/124 , H01L23/5223 , H01L27/1255 , H01L28/40
摘要: A semiconductor device includes a substrate, a first conductive layer on the substrate and including a main pattern, and substantially symmetrical auxiliary patterns extending from two sides of the main pattern, an insulating layer on the substrate and the first conductive layer, and a second conductive layer on the insulating layer and overlapping at least a portion of the main pattern and the auxiliary patterns.
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