公开(公告)号：US20120019796A1

公开(公告)日：2012-01-26

申请号：US13186068

申请日：2011-07-19

申请人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

发明人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

IPC分类号： G03B27/54

CPC分类号： G03F7/70191 ,  G02B3/0043 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083

摘要： An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.

摘要翻译： 用于微光刻的照明系统用于利用一次光源的照明光照射照明场。 第一光栅布置具有束形成的第一光栅元件，其布置在照明系统的第一平面中或与该平面相邻。 第一光栅布置用于产生二次光源的光栅布置。 传输光学器件用于将次级光源的照明光的叠加传输到照明场中。 传输光学器件具有第二光栅装置，其具有束形成第二光栅元件。 在每种情况下，第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一，用于引导整束照明光的部分束。 例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。 两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型（I至III）被分配至少一个单独距离（＆Dgr; I，＆Dgr; II，＆Dgr; III） 这种类型的第一光栅元素（I至III）和第二光栅布置的分配的第二光栅元素。 结果，获得允许特定照明参数受到影响的照明系统，使得最大程度地避免对其他照明参数的不期望的影响。

公开(公告)号：US08873023B2

公开(公告)日：2014-10-28

申请号：US13186068

申请日：2011-07-19

申请人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

发明人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70191 ,  G02B3/0043 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083

摘要： An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.

摘要翻译： 用于微光刻的照明系统用于利用一次光源的照明光照射照明场。 第一光栅布置具有束形成的第一光栅元件，其布置在照明系统的第一平面中或与该平面相邻。 第一光栅布置用于产生二次光源的光栅布置。 传输光学器件用于将次级光源的照明光的叠加传输到照明场中。 传输光学器件具有第二光栅装置，其具有束形成第二光栅元件。 在每种情况下，第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一，用于引导整束照明光的部分束。 例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。 两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型（I至III）被分配至少一个单独距离（＆Dgr; I，＆Dgr; II，＆Dgr; III） 这种类型的第一光栅元素（I至III）和第二光栅布置的分配的第二光栅元素。 结果，获得允许特定照明参数受到影响的照明系统，使得最大程度地避免对其他照明参数的不期望的影响。