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公开(公告)号:US20100020284A1
公开(公告)日:2010-01-28
申请号:US12439403
申请日:2007-08-10
申请人: Owain Llyr Parri , Alison Linda May , Julian Vaughan-Spickers , Karl Skjonnemand , Oleg Yaroshchuck
发明人: Owain Llyr Parri , Alison Linda May , Julian Vaughan-Spickers , Karl Skjonnemand , Oleg Yaroshchuck
IPC分类号: G02F1/1337 , C08F20/06
CPC分类号: G02F1/13378 , B42D25/328 , B42D25/364 , B42D2033/26
摘要: The invention relates to a method of aligning reactive mesogens (RM) on a substrate subjected to particle beam treatment, to RM's oriented by said method, especially in form of thin layers, to oriented polymers and polymer films obtained from such oriented RM's and RM layers, and to the use of the RM's, layers, polymers and films in optical, electronic and electrooptical applications.
摘要翻译: 本发明涉及将经过粒子束处理的基底上的反应性介晶(RM)与通过所述方法(特别是薄层形式)取向的RM定向到由这种取向的RM和RM层获得的取向聚合物和聚合物膜的方法 ,以及在光学,电子和电光学应用中使用RM,层,聚合物和薄膜。
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公开(公告)号:US08414983B2
公开(公告)日:2013-04-09
申请号:US12439403
申请日:2007-08-10
申请人: Owain Llyr Parri , Alison Linda May , Julian Vaughan-Spickers , Karl Skjonnemand , Oleg Yaroshchuck
发明人: Owain Llyr Parri , Alison Linda May , Julian Vaughan-Spickers , Karl Skjonnemand , Oleg Yaroshchuck
CPC分类号: G02F1/13378 , B42D25/328 , B42D25/364 , B42D2033/26
摘要: The invention relates to a method of aligning reactive mesogens (RM) on a substrate subjected to particle beam treatment, to RM's oriented by said method, especially in form of thin layers, to oriented polymers and polymer films obtained from such oriented RM's and RM layers, and to the use of the RM's, layers, polymers and films in optical, electronic and electrooptical applications.
摘要翻译: 本发明涉及将经过粒子束处理的基底上的反应性介晶(RM)与通过所述方法(特别是薄层形式)取向的RM定向到由这种取向的RM和RM层获得的取向聚合物和聚合物膜的方法 ,以及在光学,电子和电光学应用中使用RM,层,聚合物和薄膜。
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