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1.发明授权公开(公告)号：US08161421B2
公开(公告)日：2012-04-17
申请号：US12168383
申请日：2008-07-07
IPC分类号： G06F17/50
摘要： A method of training an Optical Proximity Correction (OPC) model comprises symmetrizing a complex design to be a test pattern having orthogonal symmetry. Symmetrizing may comprise establishing a axis of symmetry passing through the design, thereby dividing the design into two portions; deleting one of the two portions; and mirror-imaging the other of the two portions about the axis of symmetry. The design may be centered.
摘要翻译： 训练光学邻近校正（OPC）模型的方法包括将复杂设计对称为具有正交对称性的测试图案。 对称可以包括建立通过设计的对称轴，从而将设计分成两部分; 删除两部分之一; 并且围绕对称轴对两个部分中的另一个进行镜像成像。 设计可能居中。
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2.发明申请CALIBRATION AND VERIFICATAION STRUCTURES FOR USE IN OPTICAL PROXIMITY CORRECTION 有权用于光学近似校正的校准和验证结构公开(公告)号：US20100005440A1
公开(公告)日：2010-01-07
申请号：US12168383
申请日：2008-07-07
IPC分类号： G06F17/50
摘要： A method of training an Optical Proximity Correction (OPC) model comprises symmetrizing a complex design to be a test pattern having orthogonal symmetry. Symmetrizing may comprise establishing a axis of symmetry passing through the design, thereby dividing the design into two portions; deleting one of the two portions; and mirror-imaging the other of the two portions about the axis of symmetry. The design may be centered.
摘要翻译： 训练光学邻近校正（OPC）模型的方法包括将复杂设计对称为具有正交对称性的测试图案。 对称可以包括建立通过设计的对称轴，从而将设计分成两部分; 删除两部分之一; 并且围绕对称轴对两个部分中的另一个进行镜像成像。 设计可能居中。
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