-
1.发明申请Boron-10 coating process for neutron detector integrated circuit with high aspect ratio trenches 审中-公开具有高纵横比沟槽的中子探测器集成电路的Boron-10涂层工艺公开(公告)号：US20110014778A1
公开(公告)日：2011-01-20
申请号：US12460494
申请日：2009-07-20
Applicant: C. Christopher Klepper , Eric P. Carlson , Michael D. Keitz , Othon R. Monteiro
Inventor： C. Christopher Klepper , Eric P. Carlson , Michael D. Keitz , Othon R. Monteiro
IPC: H01L21/326 , C23C14/46
CPC classification number: H01L21/26586 , C23C14/16 , C23C14/325 , C23C14/345 , C23C14/3485
Abstract: A coating process to infill high aspect-ratio vias and trenches in semiconductor substrates with dense boron for the production of neutron detectors and other devices uses a vacuum cathodic arc or other source of fully ionized boron plasma. Biasing of the substrate is used to impart energies to the plasma ions directing them toward the substrate, while repulsing the electrons. The full ionization produced by the source allows control of the energies of the boron ions by means of the bias voltage. The bias is alternated between coating deposition at low ion energies and sputtering of already coated material by energetic ions. Most of the sputtered material comes off the substrate top surface and between the trenches or vias and much of it is redeposited, thereby contributing to the infill. The process is suitable for carbon, boron or similar light elements, and is of particular interest for 10B, an element having exceptionally high thermal neutron cross-section.
Abstract translation: 用生产中子探测器和其他器件的密实硼填充高纵横比通孔和半导体衬底中的沟槽的涂覆工艺使用真空阴极电弧或其他完全电离的硼等离子体源。 使用衬底的偏置来将等离子体离子赋予能量，将其引导向衬底，同时使电子排斥。 由源产生的完全电离可以通过偏置电压来控制硼离子的能量。 在低离子能量下的涂层沉积和通过能量离子溅射已经涂覆的材料之间，偏置是交替的。 大多数溅射的材料脱离衬底顶表面并且在沟槽或通孔之间，并且其中大部分被再沉积，从而有助于填充。 该方法适合于碳，硼或类似的轻元素，并且对于具有特别高的热中子截面的元素的10B是特别有意义的。
-
公开(公告)号：US09637680B2
公开(公告)日：2017-05-02
申请号：US13736519
申请日：2013-01-08
Applicant: James Crews , Othon R. Monteiro
Inventor： James Crews , Othon R. Monteiro
CPC classification number: C09K8/572 , C09K8/5045 , E21B33/138 , E21B43/025 , E21B43/16
Abstract: A method of reducing the presence of particles in a downhole environment, comprising contacting sediment particles contained in a downhole environment, with a composition comprising: a metallic composition, an inorganic oxide-based polymer, and a solvent; the contacting occurring in the presence of a fluid capable of decomposing the metallic composition.
-
3.发明申请METHOD OF CONTROLLING RESERVOIR PARTICLES USING ELECTROLYTIC COMPOSITE MATERIALS 有权使用电解复合材料控制储层颗粒的方法公开(公告)号：US20130175037A1
公开(公告)日：2013-07-11
申请号：US13736519
申请日：2013-01-08
Applicant: James Crews , Othon R. Monteiro
Inventor： James Crews , Othon R. Monteiro
CPC classification number: C09K8/572 , C09K8/5045 , E21B33/138 , E21B43/025 , E21B43/16
Abstract: A method of reducing the presence of particles in a downhole environment, comprising contacting sediment particles contained in a downhole environment, with a composition comprising: a metallic composition, an inorganic oxide-based polymer, and a solvent; the contacting occurring in the presence of a fluid capable of decomposing the metallic composition
Abstract translation: 一种在井下环境中减少颗粒存在的方法，包括将包含在井下环境中的沉淀物颗粒与包含金属组合物，无机氧化物基聚合物和溶剂的组合物接触; 在存在能够分解金属组合物的流体的情况下发生接触
-
-
Search Results
3
records
(took 0.007 seconds)
